Olympus Industrial Reflected Light Objectives

Browse our selection of Olympus industrial reflected light microscope objectives

What Are Olympus Industrial Reflected Light Objectives?

Browse our selection of Olympus industrial reflected light microscope objectives for BX, GX, MX, and BHM series microscopes — a comprehensive range of epi-illumination objectives engineered for semiconductor wafer inspection, materials science, metal

  • How to Choose

    • Magnification requirements (e.g., 20x, 40x, 60x)
    • Numerical aperture (NA) for resolution needs
    • Working distance depending on sample thickness
    • Compatibility with your microscope system

  • Key Advantages

    • Optics from Olympus, Nikon, Zeiss, and Leica in one place
    • Every objective inspected and quality-verified before shipping
    • Free compatibility guidance before you buy
    • Significant savings versus new list pricing

  • Who Uses Them?

    • Life science and fluorescence researchers
    • Confocal and live-cell imaging facilities
    • Semiconductor inspection and failure analysis labs
    • Industrial QC and materials science labs
Olympus 1X–5X Industrial Reflected Light Objectives | BX, GX, MX & BHM Series

Olympus 1X–5X Industrial Reflected Light Objectives | BX, GX, MX & BHM Series

Olympus Near-Infrared (IR) Microscope Objectives | 5X–100X LCPLN Series

Olympus Near-Infrared (IR) Microscope Objectives | 5X–100X LCPLN Series

10X INDUSTRIAL REFLECTED LIGHT (BX, GX, MX, BHM)

20X INDUSTRIAL REFLECTED LIGHT (BX, GX, MX, BHM)

50X INDUSTRIAL REFLECTED LIGHT (BX, GX, MX, BHM)

80X -100X

150X - 250X INDUSTRIAL REFLECTED LIGHT (BX, GX, MX, BHM)

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Olympus Industrial Reflected Light Objectives | Spach Optics

Browse our selection of Olympus industrial reflected light microscope objectives for BX, GX, MX, and BHM series microscopes — a comprehensive range of epi-illumination objectives engineered for semiconductor wafer inspection, materials science, metallurgy, quality control, and precision surface metr

The lineup spans multiple optical correction classes and working distance ranges to cover the full spectrum of industrial microscopy applications — from low-magnification survey imaging to high-NA oil and water immersion objectives for near-diffracti