Olympus MPlanFL N 100X Epi Objective | 0.90 NA, Infinity Corrected

The Olympus MPLFLN 100× Objective is a premium semi-apochromatic lens engineered for maximum magnification industrial microscopy. With an exceptional 0.90 numerical aperture at 100× magnification, this objective delivers the highest resolution available for observing ultra-fine details in microstructures, defects, and surface features that are invisible at lower magnifications.

The ultra-high 0.90 numerical aperture provides exceptional resolution and light-gathering capability, revealing the finest details in grain boundaries, microstructures, surface defects, and material features with unparalleled clarity. At 100× magnification, this objective enables observation of submicron features critical for semiconductor failure analysis, advanced metallography, and precision materials characterization.

The MPLFLN series is specifically designed for material inspection and offers excellent performance across multiple observation methods. Beyond brightfield, this objective is compatible with differential interference contrast (DIC), fluorescence, and simple polarized light techniques. This multi-modal capability enables comprehensive sample characterization at maximum magnification using a single objective.

The semi-apochromatic optical design delivers superior color correction across the visible spectrum, ensuring accurate color rendition, high contrast, and sharp imaging essential for photomicrography, digital documentation, and quantitative image analysis at high magnification. The plan fluorite construction provides flat-field imaging with minimal curvature of field, maintaining sharp focus from the center to the edge of the field of view.

With a working distance of 1.0 mm, this objective is optimized for ultra-high numerical aperture performance with polished metallographic specimens, semiconductor wafers, and other flat samples commonly encountered in industrial microscopy. The short working distance is typical for high-NA objectives at this magnification and enables the maximum resolution possible.

At 100× magnification, this objective provides the highest power for detailed structure observation, revealing submicron features and ultra-fine details critical for failure analysis, defect characterization, and advanced materials research. The combination of ultra-high numerical aperture and semi-apochromatic correction makes this objective essential for applications requiring the absolute highest resolution and image quality.

Designed for reflected light industrial microscopy, this objective features a standard RMS thread mount and is fully compatible with Olympus BX, GX, MX, and BHM series microscope systems. The robust construction and precision Japanese manufacturing ensure reliable performance in demanding production and research environments where maximum magnification and the highest image quality are essential.