Olympus LMPLANFL N 50X Long Working Distance Objective

The Olympus LMPLFLN 50× Objective is a specialized long working distance semi-apochromatic lens engineered for high-magnification applications requiring exceptional specimen clearance. With an impressive 10.6 mm working distance at 50× magnification, this objective provides the space needed for thick samples, probe-based measurements, and manipulation during observation while maintaining excellent optical performance.

Long working distance objectives at high magnification are essential when standard objectives cannot accommodate your sample geometry. The 10.6 mm clearance allows you to work with thick specimens, uneven surfaces, samples requiring environmental chambers, or applications where probe tips, heating stages, or other accessories must be positioned near the sample surface. This extra space also dramatically reduces the risk of objective damage from accidental contact with the specimen.

At 50× magnification with a numerical aperture of 0.50, this objective delivers high resolution for detailed observation of fine structures, microstructures, and surface features. The semi-apochromatic optical design provides superior color correction across the visible spectrum (400-700 nm), ensuring accurate color rendition and high-contrast imaging essential for photomicrography, digital documentation, and quantitative image analysis.

The LMPLFLN (Long Working Distance M Plan Fluorite) optical system represents Olympus's advanced plan fluorite technology optimized for extended working distances. Despite the long working distance, this objective maintains flat-field imaging with minimal curvature of field, ensuring sharp focus from center to edge — critical for photomicrography and quantitative image analysis.

As an infinity-corrected objective, this lens is designed for modern microscope systems where the image is formed at infinity, allowing the insertion of optical components such as filters, polarizers, or DIC prisms in the parallel light path without introducing aberrations. This makes it compatible with advanced contrast techniques including brightfield, differential interference contrast (DIC), and polarization microscopy.

The 50× magnification provides high power for detailed structure observation while the long working distance maintains practical usability. This combination makes it ideal for applications requiring both high magnification and specimen clearance, such as thick specimen observation, probe-based measurements, and materials characterization where sample manipulation during observation is necessary.

Featuring a standard RMS thread mount (20.32 mm × 36 TPI), this objective is compatible with most upright research microscope systems, including Olympus BX, GX, MX, and BHM series microscopes. The robust construction and precision Japanese manufacturing ensure reliable performance in demanding production and research environments.