Olympus LMPlan N 5X IR Objective | 0.10 NA Long Working Distance, Infinity Corrected

The Olympus LMPLAN N 5× IR Objective is a specialized, extra-long working distance objective engineered for near-infrared imaging applications. Optimized for wavelengths from 700 to 1600 nm, this objective is an essential tool for semiconductor inspection, silicon wafer analysis, and any application requiring imaging through materials that are opaque in visible light but transparent in the infrared spectrum.

Near-infrared microscopy enables unique capabilities that are impossible with conventional visible-light objectives. Silicon, which is opaque to visible light, becomes transparent in the near-IR, allowing you to inspect internal structures, defects, and features within silicon wafers and integrated circuits without destructive sectioning. This makes IR objectives indispensable for semiconductor failure analysis, quality control, and research applications.

The exceptional 23 mm working distance is one of the longest available for a 5× objective, providing generous clearance that is critical when working with thick specimens, probe stations, or samples requiring manipulation during observation. This extended working distance also dramatically reduces the risk of objective damage from contact with the specimen, protecting your investment in precision optics.

At 5× magnification with a numerical aperture of 0.13, this objective delivers a wide field of view with excellent depth of field, making it ideal for initial specimen survey, large-area inspection, and locating regions of interest before switching to higher magnifications. The LMPLAN optical design ensures flat-field imaging with minimal distortion, optimized specifically for infrared wavelengths.

Compatible with upright research microscopes via standard RMS thread mount, this objective integrates seamlessly into semiconductor, materials science, and photonics research workflows. Requires an IR-sensitive camera and appropriate illumination for infrared imaging.