Olympus LMPLN10XIR 10X Objective – Near-IR (700-1600 nm)

Premium 10× near-infrared objective with long working distance and correction collar — ideal for silicon wafer inspection and IR imaging.

• 🔬 10× Magnification, NA 0.25 — Balanced resolution and field of view for detailed IR imaging.
• 🔴 Near-Infrared (IR) Optimized — Corrected for 700-1600 nm wavelengths, ideal for silicon wafer inspection and IR imaging applications.
• 📏 Long Working Distance (~16 mm) — Generous clearance for thick specimens and probe-based measurements.
• ⚙️ Correction Collar — Adjustable for glass or silicon substrates to optimize optical performance.
• 🧠 Multi-Modal Capability — Compatible with brightfield, IR, and visible light imaging techniques.

🔧 Product Description

The Olympus LMPLN10XIR 10× Objective is a specialized near-infrared objective engineered for demanding semiconductor inspection and IR imaging applications. Optimized for wavelengths from 700 to 1600 nm, this objective is an essential tool for silicon wafer analysis, integrated circuit inspection, and any application requiring imaging through materials that are opaque in visible light but transparent in the infrared spectrum.

Near-infrared microscopy enables unique capabilities that are impossible with conventional visible-light objectives. Silicon, which is opaque to visible light, becomes transparent in the near-IR, allowing you to inspect internal structures, defects, and features within silicon wafers and integrated circuits without destructive sectioning. This makes IR objectives indispensable for semiconductor failure analysis, quality control, and research applications.

At 10× magnification with a numerical aperture of 0.25, this objective delivers excellent resolution and field of view for detailed IR imaging. The 16 mm working distance provides generous clearance for thick specimens, probe stations, or samples requiring manipulation during observation, while also reducing the risk of objective damage from contact with the specimen.

The integrated correction collar is a critical feature that allows you to optimize optical performance for different substrate materials. Adjust the collar for glass coverslips or silicon wafers to compensate for spherical aberration introduced by different refractive indices, ensuring sharp, high-contrast images regardless of your sample type.

The LMPLN optical design ensures flat-field imaging optimized specifically for infrared wavelengths. Multi-modal capability allows use with brightfield, IR, and visible light imaging techniques, making this objective versatile for comprehensive sample characterization.

Compatible with most upright research microscope systems via standard RMS thread mount, this objective integrates seamlessly into semiconductor, materials science, and photonics research workflows. Requires an IR-sensitive camera and appropriate illumination for infrared imaging.

🔎 Typical Applications

• Silicon wafer and IC inspection through silicon
• Semiconductor failure analysis and defect detection
• Photonics and optoelectronics research
• Near-infrared spectroscopy and imaging
• Materials characterization in the IR spectrum
• Multi-modal visible and IR imaging

📊 Key Specifications

💼 University Purchase Orders Accepted

Thank you for viewing! Please contact us with any questions about this objective or your specific near-infrared microscopy requirements.