Olympus UMPLANFL 20x Objective

The Olympus UMPLANFL 20× Objective is a versatile semi-apochromatic lens engineered for high-resolution industrial microscopy applications. With a high numerical aperture of 0.46 and 20× magnification, this objective delivers exceptional resolution and detail for demanding materials analysis, metallography, semiconductor inspection, and quality control workflows.

The UMPLANFL series represents Olympus's universal M plan fluorite design, offering well-balanced performance across multiple parameters. The high 0.46 numerical aperture provides superior light-gathering capability and resolution compared to lower NA objectives, revealing fine details in microstructures, grain boundaries, defects, and surface features that are critical for materials characterization and failure analysis.

At 20× magnification, this objective strikes an ideal balance between detail and field of view. It provides sufficient magnification to resolve fine features while maintaining a field of view large enough for efficient sample navigation and contextual observation. This makes it a workhorse objective for industrial microscopy, suitable for the widest range of applications from initial sample survey to detailed feature examination.

The semi-apochromatic optical design delivers excellent color correction across the visible spectrum, significantly superior to achromatic objectives. This ensures accurate color rendition, high contrast, and sharp imaging essential for photomicrography, digital documentation, and quantitative image analysis. The plan fluorite construction provides flat-field imaging with minimal curvature of field, maintaining sharp focus from the center to the edge of the field of view.

With a working distance of 3.1 mm, this objective provides adequate clearance for most standard samples while maintaining the high numerical aperture necessary for superior resolution. This working distance is well-suited for polished metallographic specimens, semiconductor wafers, and other flat or near-flat samples commonly encountered in industrial microscopy.

Designed for reflected light brightfield microscopy, this objective is fully compatible with Olympus BX, GX, MX, and BHM series microscope systems via standard RMS thread mount. The robust construction and precision Japanese manufacturing ensure reliable performance in demanding production and research environments where consistent, high-quality imaging is essential.