Olympus LMPLFLN 100X Objective – Long Working Distance

The Olympus LMPLFLN 100× Objective is a specialized long working distance semi-apochromatic lens engineered for maximum magnification applications requiring exceptional specimen clearance. With an impressive 3.5 mm working distance at 100× magnification, this objective provides the space needed for thick samples, probe-based measurements, and manipulation during observation while maintaining ultra-high optical performance.

Long working distance objectives at maximum magnification are essential when standard 100× objectives cannot accommodate your sample geometry. The 3.5 mm clearance allows you to work with thick specimens, uneven surfaces, samples requiring environmental chambers, or applications where probe tips, heating stages, or other accessories must be positioned near the sample surface. This extra space also dramatically reduces the risk of objective damage from accidental contact with the specimen.

At 100× magnification with a numerical aperture of 0.80, this objective delivers ultra-high resolution for detailed observation of the finest structures, microstructures, and surface features. The semi-apochromatic optical design provides superior color correction across the visible spectrum, ensuring accurate color rendition and high-contrast imaging essential for photomicrography, digital documentation, and quantitative image analysis at maximum magnification.

The LMPLFLN (Long Working Distance M Plan Fluorite) optical system represents Olympus's advanced plan fluorite technology optimized for extended working distances. Despite the long working distance, this objective maintains flat-field imaging with minimal curvature of field, ensuring sharp focus from center to edge — critical for photomicrography and quantitative image analysis at high magnification.

The 100× magnification provides maximum power for detailed structure observation, revealing submicron features and ultra-fine details critical for failure analysis, defect characterization, and advanced materials research. The long working distance maintains practical usability while delivering the highest resolution, making it ideal for applications requiring both maximum magnification and specimen clearance.

The combination of 100× magnification, 0.80 numerical aperture, and 3.5 mm working distance makes this objective uniquely capable for applications requiring detailed observation with specimen clearance. This is particularly valuable for probe-based measurements, thick specimen observation, and materials characterization where sample manipulation during observation is necessary.

Designed for reflected light industrial microscopy, this objective features a standard RMS thread mount and is fully compatible with Olympus BX, GX, MX, and BHM series microscope systems. The robust construction and precision Japanese manufacturing ensure reliable performance in demanding production and research environments where maximum magnification with extended working distance is essential.