Olympus MPlanFL N 5X Epi Objective | 0.15 NA, BD, Infinity Corrected

In stock

SKU: N6389300

Regular price $795.00
Sale price $795.00 Regular price $1,395.00 save $600.00
Premium 5× objective with brightfield and darkfield capability — ideal for industrial inspection and materials science applications.

KEY FEATURES

  • 5× Magnification, NA 0.15 — Wide field of view with excellent depth of field for overview imaging and inspection.
  • Brightfield/Darkfield (BD) Capability — Dual-mode imaging for enhanced contrast and defect detection on reflective surfaces.
  • Working Distance (12 mm) — Generous clearance provides specimen safety and accommodates thicker samples.
  • MPLANFL Plan Semi-Apochromat Design — Delivers flat-field imaging with excellent color correction across the visible spectrum.
  • M26 Thread Mount — Compatible with Olympus industrial microscope systems.
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Product Overview

The Olympus MPLANFL 5× BD Objective is a versatile, high-performance objective engineered for industrial microscopy applications requiring both wide-field overview imaging and detailed defect detection. As part of Olympus's Plan semi-apochromat series, this objective combines a 12 mm working distance with dual brightfield/darkfield imaging capability, making it an essential tool for materials analysis, quality control, and failure analysis in manufacturing and research environments.

The brightfield/darkfield (BD) design allows you to switch between two complementary imaging modes without changing objectives. Brightfield mode provides standard reflected light imaging for general observation, while darkfield mode dramatically enhances contrast by illuminating the specimen at oblique angles — revealing surface defects, scratches, grain boundaries, and other features that would be invisible in brightfield alone.

At 5× magnification with a numerical aperture of 0.15, this objective delivers a wide field of view with excellent depth of field, making it ideal for initial specimen survey, large-area inspection, and locating regions of interest before switching to higher magnifications. The 12 mm working distance provides good clearance for most industrial samples while maintaining excellent optical performance.

The MPLANFL optical design ensures flat-field imaging with minimal distortion from center to edge, while the plan semi-apochromat correction delivers excellent color fidelity and chromatic aberration control. This combination makes the objective well-suited for both visual inspection and digital documentation of industrial samples.

Technical Specifications

Magnification
Numerical Aperture (NA) 0.15
Imaging Modes Brightfield / Darkfield (BD)
Optical Design MPLANFL (Plan Semi-Apochromat)
Working Distance 12 mm
Mount M26 Thread
Application Industrial Reflected Light Microscopy
SKU N6389300
Condition Excellent, flawless optics

Microscope Compatibility

Typical Applications

Metallurgical analysis and microstructure examination
Semiconductor wafer and IC inspection
Surface defect detection and quality control
Large-area specimen survey and overview imaging
Failure analysis and forensic investigation
Materials science research and characterization
  • Designed for Mixed-Brand Lab Environments

    Olympus, Nikon, Zeiss, Leica components in one place

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    Professionally sourced and verified for performance

  • Backed by Spach Optics Warranty & Support

    Ideal for labs using multiple microscope platforms

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