Olympus UPlanFL N 20X Objective | 0.50 NA Dry, Infinity Corrected
SKU: N6445100
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20× objective with flat-field optics and excellent versatility.
- 🔬 20× Magnification, NA 0.50 — Ideal balance of resolution and light collection.
- 🧠 Plan Fluor Optical Design — Flat field and reduced optical aberrations.
- 📏 Working Distance (~2.10 mm) — Space for sample access in high-magnification workflows.
- ⚙️ Standard RMS Thread — Fits research microscopes with infinity-corrected optics.
🧪 Product Description (Long-Form)
The Olympus UPLANFLN 20× Objective is a high-performance microscope objective engineered for versatile imaging across brightfield, fluorescence, and advanced contrast techniques. With 20× magnification and a numerical aperture (NA) of 0.45, this objective delivers excellent resolution, contrast, and light-gathering ability while maintaining strong image uniformity.
Built around Olympus’s Plan Fluor optical design, this objective minimizes chromatic and spherical aberrations, giving you crisp, flat-field images from center to edge — essential for documentation, analysis, and multi-modal microscopy workflows.
One of the standout features of this objective is its correction collar, which allows fine-tuning of performance for use with oil immersion or water immersion techniques. This flexibility ensures optimal imaging quality whether you’re capturing deep cellular detail with oil or working with aqueous environments using water immersion methods.
The ~2.10 mm working distance provides sufficient space between the objective and specimen for high-magnification imaging while accommodating coverslips, perfusion chambers, or micro-manipulation tools. Designed with a standard RMS threaded mount, the UPLFLN 20× easily integrates with a wide range of upright research microscopes for versatile use in life sciences, clinical labs, and research environments.
🔎 Typical Applications
- Brightfield microscopy
- Fluorescence imaging
- DIC microscopy
- Cellular and sub-cellular imaging
📊 Key Specifications
|
Specification |
Details |
|
Magnification |
20× |
|
Numerical Aperture (NA) |
0.45 |
|
Optical Design |
Plan Fluor |
|
Working Distance |
~2.10 mm |
|
Mount |
RMS (20.32 × 36 TPI) |
|
Field of View |
26.5 mm |
|
Correction |
Reduced aberrations |
|
Condition |
New |
