Olympus MUV248 NC 8x UV Inspection Objective
Regular price
$1,995.00
Sale price
$1,995.00
Regular price
$6,500.00
save $4,505.00
Olympus MUV248 NC 8x Deep UV Inspection Objective — 248 nm optimized, M26 thread, NA 0.10, non-contact design, excellent condition.
KEY FEATURES
- 8x Magnification
- Deep UV (DUV) Optimized — 248 nm (KrF)
- NC (Non-Contact) Design
- Numerical Aperture: 0.10
- M26 Thread Mount
- Reflected Light DUV Illumination
- Excellent Condition — Flawless Optics
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Technical Specifications
| Magnification | 8x |
| Numerical Aperture (NA) | 0.10 |
| Design Wavelength | 248 nm (KrF Deep UV) |
| Design Type | NC (Non-Contact) |
| Thread | M26 |
| Illumination | Deep UV (DUV) Reflected Light |
| Model | MUV248 |
| Country of Origin | Japan |
Microscope Compatibility
| Olympus DUV inspection platforms with M26 nosepiece | |
| KrF excimer laser-based photomask inspection systems | |
| Deep UV reflected light microscope systems at 248 nm | |
| Semiconductor lithography process inspection equipment |
Typical Applications
Photomask and reticle inspection at 248 nm (KrF excimer wavelength)
Semiconductor wafer surface inspection using deep UV illumination
Contamination and defect detection on UV-sensitive substrates
DUV lithography process monitoring and quality control
Research and metrology applications requiring 248 nm wavelength imaging
