Olympus MPLAN N 10x Objective

The Olympus MPLAN N 10× Objective is a high-performance plan objective designed for industrial reflected light microscopy applications. As part of Olympus's MPLAN series, this objective combines 10× magnification with plan (flat-field) optical correction, making it an essential tool for detailed inspection, materials analysis, and quality control in manufacturing and research environments.

At 10× magnification with a numerical aperture of 0.25, this objective delivers balanced resolution and field of view, making it ideal for detailed examination of industrial specimens while maintaining sufficient context to understand the surrounding features. This magnification is particularly well-suited for applications requiring both detail and overview, such as defect detection, microstructure analysis, and surface characterization.

The plan optical design ensures that the entire field of view is in focus simultaneously, from center to edge. This flat-field correction is critical for digital imaging, photomicrography, and quantitative analysis, ensuring that measurements and observations are accurate across the entire field of view.

With a working distance of 10.6 mm, this objective provides generous clearance for specimen handling while maintaining excellent optical performance. The M26 thread mount ensures compatibility with Olympus industrial microscope systems, integrating seamlessly into metallurgical, semiconductor, and materials science workflows.