Nikon CFI Plan Fluor DL 4X Phase Contrast Objective

In stock

SKU: MRH20045

Regular price $625.00
Sale price $625.00 Regular price $1,295.00 save $670.00
Nikon CFI Plan Fluor DL 4X Phase Contrast Objective — a wide-field, low-magnification phase contrast objective ideal for specimen overview and navigation on Nikon CFI-series microscopes.

KEY FEATURES

  • 4X magnification with Plan Fluor optical correction
  • DL (Dark Low) phase contrast for high-contrast specimen imaging
  • Infinity-corrected CFI optics
  • Compatible with Nikon CFI-series microscopes
  • Condition: Excellent — flawless optics
  • University purchase orders accepted
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Product Overview

The Nikon CFI Plan Fluor DL 4X Phase Contrast Objective provides a wide field of view for specimen overview, navigation, and low-magnification phase contrast imaging. The Plan Fluor optical correction ensures bright, flat, and well-corrected images, while the DL phase ring delivers excellent contrast on unstained biological specimens. An essential objective for any multi-magnification phase contrast setup on Nikon CFI-series platforms.

Technical Specifications

Magnification 4X
Optical Correction Plan Fluor
Phase Ring DL (Dark Low)
Optics Infinity-corrected CFI
SKU NIKON-MRH20045
Condition Excellent — Flawless Optics

Microscope Compatibility

Typical Applications

Specimen overview and navigation at 4X
Low-magnification phase contrast imaging
Cell culture monitoring and colony counting
Brightfield and phase contrast workflows on Nikon CFI-series microscopes
University and research laboratory use
  • Designed for Mixed-Brand Lab Environments

    Olympus, Nikon, Zeiss, Leica components in one place

  • Quality-Verified New & Pre-Owned Equipment

    Professionally sourced and verified for performance

  • Backed by Spach Optics Warranty & Support

    Ideal for labs using multiple microscope platforms

  • Fast, Reliable U.S. Shipping

    Most orders ship quickly from within the United States

  • Expert Support from Optical Specialists

    Guidance on compatibility, selection, and configuration