Zeiss LD Epiplan-Neofluar 100x Brightfield Darkfield DIC Objective

The Zeiss LD Epiplan 100X BD DIC is a premium long working distance objective engineered specifically for reflected light (epi-illumination) microscopy applications requiring exceptional working distance, multiple observation techniques, and high-magnification imaging. As part of Zeiss's LD (Long Distance) Epiplan series, this objective combines 100X magnification with a 3mm working distance—significantly longer than standard 100X objectives—making it ideal for examining thick specimens, wafers, and samples requiring manipulation or measurement at high magnification. The "BD DIC" designation indicates compatibility with Brightfield, Darkfield, and Differential Interference Contrast (DIC) imaging modes, making this objective exceptionally versatile for revealing different types of surface features, defects, and microstructural details. With a high numerical aperture of 0.75, this objective provides outstanding resolution for detailed examination of metal surfaces, semiconductors, and other reflective specimens, while the long working distance provides ample clearance for DIC prisms, polarizers, and other optical accessories. The infinity-corrected optical design ensures compatibility with modern Zeiss Axio microscope systems and allows for the insertion of optical components without compromising image quality. This objective is in excellent condition with flawless optics, offering professional-grade multi-contrast performance at high magnification with extended working distance.