Zeiss LD Epiplan 50x Long Working Distance Objective 448250
Regular price
$1,300.00
Sale price
$1,300.00
Regular price
$3,200.00
save $1,900.00
Zeiss LD Epiplan 50X Long Working Distance Microscope Objective for Reflected Light Microscopy
KEY FEATURES
- High-performance LD Epiplan objective for reflected light microscopy
- 50X magnification with 0.50 numerical aperture for detailed imaging
- Extra-long 7.0mm working distance ideal for thick specimens and manipulation
- RMS thread (M27 adapter available upon request) compatible with Zeiss microscope systems
- Excellent condition with flawless optics
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Technical Specifications
| Model / Catalog Number | Zeiss LD Epiplan 50X / 442850 |
| Magnification | 50X |
| Numerical Aperture (NA) | 0.50 |
| Optical Design | LD Epiplan, Infinity-Corrected |
| Illumination Type | Reflected light (epi-illumination) |
| Working Distance | 7.0mm (extra-long working distance) |
| Thread Type | RMS (M27 adapter available upon request) |
| Compatibility | Zeiss infinity-corrected reflected light microscopes |
| Recommended Applications | Metallurgy, materials science, semiconductor inspection, probe access |
| Condition | Excellent, flawless optics |
Microscope Compatibility
Typical Applications
Metallurgical analysis and materials science
Semiconductor wafer inspection with probe access
Industrial quality control and surface inspection
Failure analysis requiring manipulation access
Microstructural analysis with measurement tools
Printed circuit board (PCB) inspection
Thick specimen imaging requiring maximum working distance
Brightfield reflected light microscopy
