Zeiss LD Epiplan 50x Long Working Distance Objective 448250

In stock

SKU: 442850

Regular price $1,300.00
Sale price $1,300.00 Regular price $3,200.00 save $1,900.00
Zeiss LD Epiplan 50X Long Working Distance Microscope Objective for Reflected Light Microscopy

KEY FEATURES

  • High-performance LD Epiplan objective for reflected light microscopy
  • 50X magnification with 0.50 numerical aperture for detailed imaging
  • Extra-long 7.0mm working distance ideal for thick specimens and manipulation
  • RMS thread (M27 adapter available upon request) compatible with Zeiss microscope systems
  • Excellent condition with flawless optics
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Product Overview

The Zeiss LD Epiplan 50X is a specialized long working distance objective engineered specifically for reflected light (epi-illumination) microscopy applications requiring exceptional working distance at high magnification. As part of Zeiss's LD (Long Distance) Epiplan series, this objective combines 50X magnification with an exceptionally long 7.0mm working distance—among the longest available for this magnification class—making it ideal for examining thick specimens, wafers, samples requiring extensive manipulation, or applications where ample clearance is essential. With a numerical aperture of 0.50, this objective provides excellent resolution for detailed examination of metal surfaces, semiconductors, and other reflective specimens, while the extended working distance provides exceptional clearance for measurement tools, probes, and optical accessories. The infinity-corrected optical design ensures compatibility with modern Zeiss microscope systems and allows for the insertion of optical components without compromising image quality. Featuring standard RMS threading with optional M27 adapter availability, this objective integrates seamlessly with Zeiss Axio and other infinity-corrected reflected light microscopes. This objective is in excellent condition with flawless optics, offering professional-grade performance for laboratories and quality control facilities requiring maximum working distance at 50X magnification.

Technical Specifications

Model / Catalog Number Zeiss LD Epiplan 50X / 442850
Magnification 50X
Numerical Aperture (NA) 0.50
Optical Design LD Epiplan, Infinity-Corrected
Illumination Type Reflected light (epi-illumination)
Working Distance 7.0mm (extra-long working distance)
Thread Type RMS (M27 adapter available upon request)
Compatibility Zeiss infinity-corrected reflected light microscopes
Recommended Applications Metallurgy, materials science, semiconductor inspection, probe access
Condition Excellent, flawless optics

Microscope Compatibility

Typical Applications

Metallurgical analysis and materials science
Semiconductor wafer inspection with probe access
Industrial quality control and surface inspection
Failure analysis requiring manipulation access
Microstructural analysis with measurement tools
Printed circuit board (PCB) inspection
Thick specimen imaging requiring maximum working distance
Brightfield reflected light microscopy
  • Designed for Mixed-Brand Lab Environments

    Olympus, Nikon, Zeiss, Leica components in one place

  • Quality-Verified New & Pre-Owned Equipment

    Professionally sourced and verified for performance

  • Backed by Spach Optics Warranty & Support

    Ideal for labs using multiple microscope platforms

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    Most orders ship quickly from within the United States

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    Guidance on compatibility, selection, and configuration