Zeiss LD Epiplan 50x Long Working Distance Objective

The Zeiss LD Epiplan 50X is a high-performance long working distance objective engineered specifically for reflected light (epi-illumination) microscopy applications requiring extended working distance at high magnification. As part of Zeiss's LD (Long Distance) Epiplan series, this objective combines 50X magnification with a 3.5mm working distance, providing excellent clearance for thick specimens, wafers, and samples requiring manipulation or measurement. With a numerical aperture of 0.60, this objective delivers exceptional resolution and light-gathering capability for detailed examination of metal surfaces, semiconductors, and other reflective specimens. The infinity-corrected optical design ensures compatibility with modern Zeiss microscope systems and allows for the insertion of optical accessories without compromising image quality. Featuring standard RMS threading with optional M27 adapter availability, this objective integrates seamlessly with Zeiss Axio and other infinity-corrected reflected light microscopes. This objective is in excellent condition, offering professional-grade performance for laboratories and quality control facilities conducting metallurgical analysis, semiconductor inspection, and materials characterization.