ZEISS LD EPIPLAN 20X OBJECTIVE

The Zeiss LD Epiplan 20X is a versatile long working distance objective engineered specifically for reflected light (epi-illumination) microscopy applications requiring extended working distance at mid-magnification. As part of Zeiss's LD (Long Distance) Epiplan series, this objective combines 20X magnification with extended working distance, providing excellent clearance for thick specimens, wafers, and samples requiring manipulation or measurement. With a numerical aperture of 0.40, this objective delivers good resolution and light-gathering capability for detailed examination of metal surfaces, semiconductors, and other reflective specimens. The infinity-corrected optical design ensures compatibility with modern Zeiss microscope systems and allows for the insertion of optical accessories such as polarizers and beam splitters without compromising image quality. Featuring standard RMS threading, this objective integrates seamlessly with Zeiss Axio and other infinity-corrected reflected light microscopes. This objective is in excellent condition, offering professional-grade performance for laboratories and quality control facilities conducting metallurgical analysis, semiconductor inspection, and materials characterization at mid-magnification.