Zeiss LD EC Epiplan Neofluar 50X BD DIC Objective

In stock

SKU: 422472

Regular price $3,500.00
Sale price $3,500.00 Regular price $4,950.00 save $1,450.00
Zeiss LD EC Epiplan-Neofluar 50X BD DIC Long Working Distance Microscope Objective for Reflected Light Microscopy

KEY FEATURES

  • Premium LD EC Epiplan-Neofluar objective for reflected light microscopy
  • 50X magnification with 0.55 numerical aperture for high-resolution imaging
  • Neofluar optics deliver superior chromatic correction and high contrast
  • Multi-contrast capability: Brightfield, Darkfield, and DIC compatible
  • Ultra-long 9mm working distance ideal for thick specimens and manipulation
  • M27 thread compatible with Zeiss Axio series microscope systems
  • Excellent condition with Flawless Optics
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Product Overview

The Zeiss LD EC Epiplan-Neofluar 50X BD DIC is a premium long working distance objective engineered specifically for reflected light (epi-illumination) microscopy applications requiring exceptional working distance, multiple observation techniques, and superior optical quality. As part of Zeiss's LD EC (Long Distance Extended Contrast) Epiplan-Neofluar series, this objective combines advanced Neofluar optical design with multi-contrast capability and an ultra-long 9mm working distance—among the longest available for 50X magnification. The Neofluar optical formula provides enhanced chromatic correction compared to standard objectives, ensuring accurate color reproduction and improved image quality when examining metal surfaces, semiconductors, and other reflective specimens. The "BD DIC" designation indicates compatibility with Brightfield, Darkfield, and Differential Interference Contrast (DIC) imaging modes, making this objective exceptionally versatile for revealing different types of surface features, defects, and microstructural details. With a 50X magnification and 0.55 numerical aperture, this objective provides excellent resolution for detailed examination, while the exceptional 9mm working distance provides unprecedented clearance for thick specimens, wafers, samples requiring extensive manipulation, measurement tools, probes, and the insertion of DIC prisms or other optical accessories. The M27 thread ensures compatibility with modern Zeiss Axio series microscopes. This objective is in new/open box condition, offering professional-grade multi-contrast performance with maximum working distance.

Technical Specifications

Model / Catalog Number Zeiss LD EC Epiplan-Neofluar 50X BD DIC / 422472
Magnification 50X
Numerical Aperture (NA) 0.55
Optical Design LD EC Epiplan-Neofluar, Infinity-Corrected
Illumination Type Reflected light (epi-illumination)
Contrast Modes Brightfield, Darkfield, DIC (Differential Interference Contrast)
Working Distance 9mm (ultra-long working distance)
Thread Type M27 (27mm metric thread)
Compatibility Zeiss Axio series reflected light microscopes
Optical Correction Neofluar (enhanced chromatic correction)
Recommended Applications Metallurgy, materials science, semiconductor inspection, multi-contrast imaging
Condition Excellent, flawless optics

Microscope Compatibility

Typical Applications

Metallurgical analysis and materials science with multiple contrast modes
Semiconductor wafer inspection with probe access
Industrial quality control and surface inspection
Failure analysis requiring brightfield, darkfield, and DIC imaging
Microstructural analysis with measurement tools
Printed circuit board (PCB) inspection with enhanced contrast
Thick specimen imaging requiring maximum working distance
Multi-contrast reflected light microscopy for comprehensive analysis
  • Designed for Mixed-Brand Lab Environments

    Olympus, Nikon, Zeiss, Leica components in one place

  • Quality-Verified New & Pre-Owned Equipment

    Professionally sourced and verified for performance

  • Backed by Spach Optics Warranty & Support

    Ideal for labs using multiple microscope platforms

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    Most orders ship quickly from within the United States

  • Expert Support from Optical Specialists

    Guidance on compatibility, selection, and configuration