Zeiss LD EC Epiplan Neofluar 100X BD DIC Objective
Regular price
$6,495.00
Zeiss LD EC Epiplan-Neofluar 100X BD DIC Long Working Distance Microscope Objective for Reflected Light Microscopy
KEY FEATURES
- Premium LD EC Epiplan-Neofluar objective for reflected light microscopy
- 100X magnification with 0.75 numerical aperture for exceptional resolution
- Neofluar optics deliver superior chromatic correction and high contrast
- Multi-contrast capability: Brightfield, Darkfield, and DIC compatible
- Extra-long 4.1mm working distance ideal for thick specimens and manipulation
- M27 thread compatible with Zeiss Axio series microscope systems
- New condition
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Technical Specifications
| Model / Catalog Number | Zeiss LD EC Epiplan-Neofluar 100X BD DIC / 422492-9960 |
| Magnification | 100X |
| Numerical Aperture (NA) | 0.75 |
| Optical Design | LD EC Epiplan-Neofluar, Infinity-Corrected |
| Illumination Type | Reflected light (epi-illumination) |
| Contrast Modes | Brightfield, Darkfield, DIC (Differential Interference Contrast) |
| Working Distance | 4.1mm (extra-long working distance) |
| Thread Type | M27 (27mm metric thread) |
| Compatibility | Zeiss Axio series reflected light microscopes |
| Optical Correction | Neofluar (enhanced chromatic correction) |
| Recommended Applications | Metallurgy, materials science, semiconductor inspection, multi-contrast imaging |
| Condition | New |
Microscope Compatibility
Typical Applications
Metallurgical analysis and materials science with multiple contrast modes
Semiconductor wafer inspection with probe access
Industrial quality control and surface inspection
Failure analysis requiring brightfield, darkfield, and DIC imaging
Microstructural analysis with measurement tools
Printed circuit board (PCB) inspection with enhanced contrast
High-magnification imaging requiring long working distance
Multi-contrast reflected light microscopy for comprehensive analysis
