Zeiss LD C Epiplan Apochromat 100X DIC Objective
Regular price
$3,995.00
Sale price
$3,995.00
Regular price
$8,300.00
save $4,305.00
Zeiss LD C Epiplan Apochromat 100X DIC Microscope Objective for Reflected Light Microscopy
KEY FEATURES
- Ultra-premium LD C Epiplan Apochromat objective for reflected light microscopy
- 100X magnification with 0.75 numerical aperture for exceptional resolution
- Apochromatic correction delivers superior color fidelity across the spectrum
- Optimized for 405 nm wavelength for specialized imaging applications
- Long 4.0mm working distance ideal for thick specimens and manipulation
- DIC compatible for enhanced contrast imaging
- M27 thread compatible with Zeiss Axio series microscope systems
- New / open box condition
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Technical Specifications
| Model / Catalog Number | Zeiss LD C Epiplan Apochromat 100X DIC / 422492-9801 |
| Magnification | 100X |
| Numerical Aperture (NA) | 0.75 |
| Optical Design | LD C Epiplan Apochromat, Infinity-Corrected |
| Illumination Type | Reflected light (epi-illumination) |
| Chromatic Correction | Apochromat (superior color correction) |
| Wavelength Optimization | 405 nm |
| Contrast Modes | DIC (Differential Interference Contrast) compatible |
| Working Distance | 4.0mm (long working distance) |
| Thread Type | M27 (27mm metric thread) |
| Compatibility | Zeiss Axio series reflected light microscopes |
| Recommended Applications | Confocal, laser scanning, metallurgy, semiconductor inspection, DIC imaging |
| Condition | New / open box |
Microscope Compatibility
Typical Applications
Confocal microscopy with 405 nm laser excitation
Laser scanning microscopy and specialized imaging
Metallurgical analysis requiring apochromatic correction
Semiconductor wafer inspection with DIC
Industrial quality control and surface inspection
Multi-wavelength imaging and color analysis
Microstructural analysis with enhanced contrast
High-magnification imaging requiring long working distance
