Zeiss Epiplan-Neofluar 100x Brightfield Darkfield DIC Objective
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$1,100.00
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$1,100.00
Regular price
$2,500.00
save $1,400.00
Zeiss Epiplan-Neofluar 100X BD DIC Microscope Objective for Reflected Light Microscopy
KEY FEATURES
- High-performance Epiplan-Neofluar objective for reflected light microscopy
- 100X magnification with 0.90 numerical aperture for exceptional resolution
- Neofluar optics deliver superior chromatic correction and high contrast
- Multi-contrast capability: Brightfield, Darkfield, and DIC compatible
- 0.32mm working distance suitable for standard specimen preparations
- M27 thread compatible with Zeiss Axio series microscope systems
- Excellent condition with flawless optics
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Technical Specifications
| Model / Catalog Number | Zeiss Epiplan-Neofluar 100X BD DIC / 442385 |
| Magnification | 100X |
| Numerical Aperture (NA) | 0.90 |
| Optical Design | Epiplan-Neofluar, Infinity-Corrected |
| Illumination Type | Reflected light (epi-illumination) |
| Contrast Modes | Brightfield, Darkfield, DIC (Differential Interference Contrast) |
| Working Distance | 0.32mm |
| Thread Type | M27 (27mm metric thread) |
| Compatibility | Zeiss Axio series reflected light microscopes |
| Optical Correction | Neofluar (enhanced chromatic correction) |
| Recommended Applications | Metallurgy, materials science, semiconductor inspection, multi-contrast imaging |
| Condition | Excellent, flawless optics |
Microscope Compatibility
Typical Applications
Metallurgical analysis and materials science with multiple contrast modes
Semiconductor wafer inspection and defect characterization
Industrial quality control and surface inspection
Failure analysis requiring brightfield, darkfield, and DIC imaging
Microstructural analysis and grain boundary examination
Printed circuit board (PCB) inspection with enhanced contrast
Fine surface feature analysis at high magnification
Multi-contrast reflected light microscopy for comprehensive analysis
