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Olympus SLMPlan N 100X Epi Objective | 0.60 NA Super Long Working Distance, Infinity Corrected

Regular price $7,900.00

SKU: N2246600

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High-magnification super long working distance optical objective for brightfield and inspection microscopy.

  • ๐Ÿ”ฌ 100ร— Magnification, NA 0.60 โ€” Strong resolving power for detailed specimen analysis with ample space from the specimen.
  • ๐Ÿง  Super Long Working Distance (~7.6 mm) โ€” Designed for imaging with thick samples or inspection tools without risk of contact.
  • ๐ŸŽฏ Plan Achromat Optical Design โ€” Minimizes chromatic and spherical aberrations for sharp, flat images.
  • ๐Ÿ“ธ Ideal for Brightfield and Inspection Use โ€” Excellent choice for material evaluation, industrial microscopy, and research applications.
  • โš™๏ธ Standard RMS Threaded Mount โ€” Compatible with a wide range of upright microscope systems.

๐Ÿงช Product Description (Long-Form)

The Olympus SLMPLN 100X Objective is a specialized microscope objective designed to deliver 100ร— magnification with a super long working distance, making it ideal for brightfield microscopy, inspection tasks, and applications that require both high detail and spatial clearance above the specimen.

With a numerical aperture (NA) of 0.60 and a working distance of approximately 7.6 mm, this objective ensures excellent resolution while maintaining a sizable gap between the lens and the sample โ€” a valuable feature for evaluating thick specimens, using manipulators, or working with fixtures that would interfere with shorter-working-distance lenses.

The Plan Achromat optical design provides enhanced flat field performance and reduced aberrations across the visible spectrum, delivering sharp, uniform images that are well suited for demanding microscopy, quality control, and routine inspection workflows.

Built with a standard RMS threaded mount, this objective fits seamlessly into upright microscope stands used in industrial, clinical, and research environments, providing reliability and compatibility in diverse imaging setups.


๐Ÿ”Ž Typical Applications

  • Brightfield microscopy
  • Industrial inspection and materials evaluation
  • Thick specimen imaging
  • Quality control and measurement tasks
  • Research and documentation imaging

๐Ÿ“Š Key Specifications

Specification

Details

Magnification

100ร—

Numerical Aperture (NA)

0.60

Optical Design

Super Long Working Distance Plan Achromat

Working Distance

~7.6 mm

Field Flatness

Enhanced for uniform focus

Chromatic Correction

Achromat

Mount

RMS threaded

Compatible Microscopes

Upright research and inspection systems

Condition

New

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