Olympus MPlanFL N 50X Epi Objective | 0.80 NA, Infinity Corrected

The Olympus MPLFLN 50× Objective is a premium semi-apochromatic lens engineered for maximum resolution industrial microscopy. With an exceptional 0.80 numerical aperture at 50× magnification, this objective delivers resolution and light-gathering performance that rivals objectives of much higher magnification, making it ideal for demanding materials analysis, metallography, and semiconductor inspection.

The ultra-high 0.80 numerical aperture provides exceptional resolution, revealing the finest details in microstructures, grain boundaries, defects, and surface features with unparalleled clarity. This exceptional light-gathering capability also enables imaging of low-contrast features and provides superior performance in challenging lighting conditions. For semiconductor failure analysis, advanced metallography, and precision materials characterization, this objective delivers the highest resolution available at 50× magnification.

The MPLFLN series is specifically designed for material inspection and offers excellent performance across multiple observation methods. Beyond brightfield, this objective is compatible with differential interference contrast (DIC), fluorescence, and simple polarized light techniques. This multi-modal capability enables comprehensive sample characterization using a single objective, improving workflow efficiency and reducing the need for objective changes.

The semi-apochromatic optical design delivers superior color correction across the visible spectrum, ensuring accurate color rendition, high contrast, and sharp imaging essential for photomicrography, digital documentation, and quantitative image analysis. The plan fluorite construction provides flat-field imaging with minimal curvature of field, maintaining sharp focus from the center to the edge of the field of view.

With a working distance of 1.0 mm, this objective is optimized for high numerical aperture performance with polished metallographic specimens, semiconductor wafers, and other flat samples commonly encountered in industrial microscopy. The high NA and short working distance combination delivers the maximum resolution possible at this magnification.

At 50× magnification, this objective provides high power for detailed structure observation, revealing fine features critical for materials characterization and failure analysis. The combination of ultra-high numerical aperture and semi-apochromatic correction makes this objective a top choice for applications requiring the highest image quality and resolution.

Designed for reflected light industrial microscopy, this objective features a standard RMS thread mount and is fully compatible with Olympus BX, GX, MX, and BHM series microscope systems. The robust construction and precision Japanese manufacturing ensure reliable performance in demanding production and research environments where the highest image quality and resolution are essential.