Olympus MPLFLN 20X Objective – Brightfield

Premium 20× semi-apochromatic objective with high numerical aperture — ideal for high-resolution industrial microscopy and detailed materials analysis.

• 🔬 20× Magnification, NA 0.45 — High numerical aperture delivers excellent resolution and light-gathering capability.
• ✨ Semi-Apochromatic Correction — Superior color correction and image quality across the visible spectrum.
• 🎯 Plan Fluorite (MPLFLN) Optics — Flat-field imaging from center to edge for accurate documentation.
• 🔆 Brightfield Optimized — Designed for standard brightfield reflected light microscopy.
• ⚖️ Balanced Performance — Optimal combination of resolution, working distance, and field of view.

🔧 Product Description

The Olympus MPLFLN 20× Objective is a premium semi-apochromatic lens engineered for high-resolution industrial microscopy applications. With 20× magnification and a 0.45 numerical aperture, this objective delivers exceptional resolution and detail for demanding materials analysis, metallography, semiconductor inspection, and quality control workflows.

The MPLFLN series represents Olympus's M plan fluorite design, offering well-balanced performance with semi-apochromatic color correction. The high 0.45 numerical aperture provides excellent light-gathering capability and resolution, revealing fine details in microstructures, grain boundaries, defects, and surface features that are critical for materials characterization and failure analysis.

At 20× magnification, this objective strikes an ideal balance between detail and field of view. It provides sufficient magnification to resolve fine features while maintaining a field of view large enough for efficient sample navigation and contextual observation. This makes it a versatile workhorse objective for industrial microscopy, suitable for the widest range of applications from initial sample survey to detailed feature examination.

The semi-apochromatic optical design delivers superior color correction across the visible spectrum, significantly better than achromatic objectives. This ensures accurate color rendition, high contrast, and sharp imaging essential for photomicrography, digital documentation, and quantitative image analysis. The plan fluorite construction provides flat-field imaging with minimal curvature of field, maintaining sharp focus from the center to the edge of the field of view.

With a working distance of 3.1 mm, this objective provides good clearance for most standard samples while maintaining the high numerical aperture necessary for superior resolution. This working distance is well-suited for polished metallographic specimens, semiconductor wafers, and other flat or near-flat samples commonly encountered in industrial microscopy.

Designed for reflected light brightfield microscopy, this objective is fully compatible with Olympus BX, GX, MX, and BHM series microscope systems via standard RMS thread mount. The robust construction and precision Japanese manufacturing ensure reliable performance in demanding production and research environments where consistent, high-quality imaging is essential.

🔎 Typical Applications

• Metallography and microstructure analysis
• Semiconductor wafer and IC inspection
• Materials science and grain boundary analysis
• Quality control and failure analysis
• Precision optics and surface characterization
• Industrial research and development

📊 Key Specifications

💼 University Purchase Orders Accepted

Thank you for viewing! Please contact us with any questions about this objective or your specific industrial microscopy requirements.