Olympus MPlanFL N 100X Epi Objective | 0.90 NA, BD, Infinity Corrected

The Olympus MPLFLN-BD 100× Objective is a premium semi-apochromatic lens engineered for maximum resolution industrial microscopy. With an exceptional 0.90 numerical aperture at 100× magnification, this objective delivers the highest resolution available for observing ultra-fine details while providing dual brightfield/darkfield capability for comprehensive sample characterization.

The ultra-high 0.90 numerical aperture provides exceptional resolution and light-gathering capability, revealing the finest details in grain boundaries, microstructures, surface defects, and material features with unparalleled clarity. At 100× magnification, this objective enables observation of submicron features critical for semiconductor failure analysis, advanced metallography, and precision materials characterization.

The dual brightfield/darkfield capability makes this objective exceptionally versatile for industrial inspection and quality control at maximum magnification. Brightfield illumination provides standard observation for general sample characterization, while darkfield reveals surface defects, scratches, contamination, and structural irregularities with exceptional contrast. Features invisible in brightfield become dramatically visible in darkfield, making this objective invaluable for semiconductor wafer inspection, precision machining quality control, and surface defect analysis at the highest magnification.

The MPLFLN series is specifically designed for material inspection and offers excellent performance across multiple observation methods. Beyond brightfield and darkfield, this objective is compatible with differential interference contrast (DIC), fluorescence, and simple polarized light techniques. This multi-modal capability enables comprehensive sample characterization at maximum magnification using a single objective.

The semi-apochromatic optical design delivers superior color correction across the visible spectrum, ensuring accurate color rendition, high contrast, and sharp imaging essential for photomicrography, digital documentation, and quantitative image analysis at maximum magnification. The plan fluorite construction provides flat-field imaging with minimal curvature of field, maintaining sharp focus from the center to the edge of the field of view.

With a working distance of 1.0 mm, this objective is optimized for ultra-high numerical aperture performance with polished metallographic specimens, semiconductor wafers, and other flat samples commonly encountered in industrial microscopy. The short working distance is typical for high-NA objectives at this magnification and enables the maximum resolution possible.

Designed for reflected light industrial microscopy, this objective features an M26 thread mount and is fully compatible with Olympus BX, GX, MX, and BHM series microscope systems. The robust construction and precision Japanese manufacturing ensure reliable performance in demanding production and research environments where maximum magnification, the highest image quality, and versatile contrast capabilities are essential.