Olympus MPLAPON 100X Objective – Oil Immersion Reflected Light (NA 1.45)

The Olympus MPLAPON 100× Oil Immersion Objective represents the absolute pinnacle of industrial microscopy optics, featuring an extraordinary 1.45 numerical aperture — the highest available from Olympus. This flagship objective delivers unparalleled resolution and image quality for the most demanding applications requiring observation of the finest details at maximum magnification.

The extraordinary 1.45 numerical aperture is achieved through oil immersion technology, where a drop of immersion oil with a refractive index matching glass is placed between the objective front lens and the sample. This eliminates the refractive index mismatch that occurs with air, dramatically increasing the numerical aperture and delivering resolution that approaches the theoretical limits of light microscopy. At 100× magnification with NA 1.45, this objective reveals ultra-fine details invisible to lower-NA objectives.

Plan apochromat correction represents the highest level of optical correction available. Unlike achromat or semi-apochromat objectives, plan apochromats correct for chromatic aberration across the entire visible spectrum with exceptional precision, eliminate spherical aberration, and provide perfectly flat fields. This ensures the sharpest possible images with accurate color rendition, no color fringing, and uniform focus from center to edge — essential for critical imaging and quantitative analysis.

The MPLAPON series represents Olympus's flagship M plan apochromat design for industrial microscopy, offering the ultimate combination of resolution, color correction, and field flatness. This objective is specifically engineered for reflected light applications where the absolute highest image quality is required, such as semiconductor failure analysis, advanced metallography, and precision materials characterization.

At 100× magnification with 1.45 numerical aperture, this objective provides the highest resolving power available, enabling observation of submicron features and ultra-fine details that are critical for failure analysis, defect characterization, and advanced materials research. The exceptional light-gathering capability also enables imaging of low-contrast features with superior signal-to-noise ratios.

With a working distance of 0.10 mm, this objective is optimized for maximum numerical aperture performance with polished metallographic specimens and semiconductor wafers. The very short working distance is necessary to achieve the extraordinary 1.45 NA and requires careful sample preparation and handling, but delivers resolution that cannot be achieved any other way.

Designed for reflected light industrial microscopy, this objective features a standard RMS thread mount and is fully compatible with Olympus BX, GX, MX, and BHM series microscope systems. The robust construction and precision Japanese manufacturing ensure reliable performance in demanding research environments where the absolute highest resolution and image quality are essential. This is a special order item for applications requiring the ultimate in optical performance.