Olympus MPLAPON 100X Objective – Dry Reflected Light (NA 0.95)

The Olympus MPLAPON 100× Dry Objective represents the pinnacle of dry objective optics for industrial microscopy, featuring an exceptional 0.95 numerical aperture — the highest available for a dry objective. This flagship lens delivers extraordinary resolution and image quality without requiring immersion media, making it ideal for applications where oil immersion is impractical or undesirable.

The ultra-high 0.95 numerical aperture represents the practical limit for dry objectives and provides resolution approaching that of oil immersion objectives. At 100× magnification with NA 0.95, this objective reveals ultra-fine details and submicron features with exceptional clarity while eliminating the need for immersion oil. This simplifies workflow, reduces sample contamination risks, and enables observation of samples that cannot tolerate oil contact.

Plan apochromat correction represents the highest level of optical correction available. Unlike achromat or semi-apochromat objectives, plan apochromats correct for chromatic aberration across the entire visible spectrum with exceptional precision, eliminate spherical aberration, and provide perfectly flat fields. This ensures the sharpest possible images with accurate color rendition, no color fringing, and uniform focus from center to edge — essential for critical imaging and quantitative analysis.

The MPLAPON series represents Olympus's flagship M plan apochromat design for industrial microscopy, offering the ultimate combination of resolution, color correction, and field flatness. Each objective is guaranteed to achieve a Strehl ratio of 95% or better, ensuring high-level wavefront aberration correction and diffraction-limited performance. This level of optical quality is essential for the most demanding applications requiring the absolute highest image fidelity.

At 100× magnification with 0.95 numerical aperture, this objective provides the highest resolving power available without immersion media, enabling observation of submicron features and ultra-fine details critical for failure analysis, defect characterization, and advanced materials research. The exceptional light-gathering capability also enables imaging of low-contrast features with superior signal-to-noise ratios.

With a working distance of 0.35 mm, this objective provides practical clearance for polished metallographic specimens and semiconductor wafers while maintaining the ultra-high numerical aperture necessary for maximum resolution. This working distance is significantly longer than oil immersion objectives of comparable NA, providing easier sample handling and reduced risk of contact damage.

Designed for reflected light industrial microscopy, this objective features a standard RMS thread mount and is fully compatible with Olympus BX, GX, MX, and BHM series microscope systems. The robust construction and precision Japanese manufacturing ensure reliable performance in demanding research and production environments where the highest dry objective resolution and image quality are essential.