Olympus MPlanApo 20X Objective

In stock

SKU: 1-UM925

Regular price $1,995.00
Sale price $1,995.00 Regular price $4,995.00 save $3,000.00
OLYMPUS MPLANAPO 20X REFLECTED LIGHT OBJECTIVE

KEY FEATURES

  • Plan apochromat design with superior chromatic correction
  • Strehl ratio ≥95% for exceptional wavefront aberration control
  • 0.6 NA / 0.9mm working distance for high-resolution reflected light imaging
  • Flawless optical condition, as-new performance
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Product Overview

The Olympus MPlanApo 20X objective represents the pinnacle of reflected-light microscopy optics, delivering plan apochromat-level chromatic correction and flat-field imaging across the entire field of view. Engineered for industrial metallography, semiconductor inspection, and materials science applications, this objective achieves a Strehl ratio of 95% or better, ensuring minimal wavefront aberration and maximum resolution at the diffraction limit. The 0.6 numerical aperture provides excellent light-gathering capability and resolving power, while the 0.9mm working distance accommodates a variety of sample geometries. Its RMS threading ensures broad compatibility with legacy and modern Olympus industrial microscope platforms, making it an ideal choice for upgrading existing systems or building high-performance reflected-light configurations.

Technical Specifications

Catalog Number 1-UM925
Manufacturer Olympus Corporation
Objective Type Plan Apochromat (MPlanApo)
Magnification 20X
Numerical Aperture (NA) 0.6
Working Distance 0.9 mm
Optical Correction Plan Apochromat (Strehl ratio ≥95%)
Illumination Mode Reflected Light (Brightfield/Darkfield)
Thread Type RMS (0.800"-36 TPI)
Condition Flawless, As New
Country of Origin Japan

Microscope Compatibility

Typical Applications

Metallographic analysis and grain structure characterization
Semiconductor wafer and die inspection
Surface topography and defect analysis
Failure analysis and quality control in manufacturing
Materials science research and phase identification
Forensic examination of trace evidence
  • Designed for Mixed-Brand Lab Environments

    Olympus, Nikon, Zeiss, Leica components in one place

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    Professionally sourced and verified for performance

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    Ideal for labs using multiple microscope platforms

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