Olympus LMPLFLN-BD 50X Objective – Long Working Distance

Premium 50× semi-apochromatic objective with long working distance and dual contrast modes — ideal for high-magnification observation requiring exceptional clearance and versatile imaging capabilities.

• 🔬 50× Magnification, NA 0.50 — High magnification with excellent resolution for detailed structure observation.
• 📏 Long Working Distance (10.6 mm) — Exceptional clearance for thick specimens and reduced risk of sample contact.
• 🌓 Brightfield & Darkfield (BD) — Dual contrast modes for versatile observation and superior defect detection.
• ✨ Semi-Apochromatic Correction — Superior color correction and image quality across the visible spectrum.
• 🎯 Plan Fluorite (LMPLFLN) Optics — Flat-field imaging from center to edge for accurate documentation.

🔧 Product Description

The Olympus LMPLFLN-BD 50× Objective is a specialized long working distance semi-apochromatic lens engineered for high-magnification applications requiring both exceptional specimen clearance and dual contrast capability. Combining 50× magnification, 10.6 mm working distance, and brightfield/darkfield modes in a single objective, this lens is an essential tool for demanding industrial microscopy and materials analysis.

Long working distance objectives at high magnification are critical for advanced microscopy applications that standard objectives simply cannot accommodate. The 10.6 mm clearance allows you to work with thick specimens, uneven surfaces, samples requiring environmental chambers, probe stations for electrical measurements, micromanipulators, or any setup where accessories must be positioned near the sample surface. This generous space also virtually eliminates the risk of objective damage from accidental contact with the specimen or stage.

The dual brightfield/darkfield capability makes this objective exceptionally versatile for industrial inspection and quality control at high magnification. Brightfield illumination provides standard observation for general sample characterization, while darkfield reveals surface defects, scratches, contamination, and structural irregularities with exceptional contrast. Features invisible in brightfield become dramatically visible in darkfield, making this objective invaluable for semiconductor wafer inspection, precision machining quality control, and surface defect analysis at high magnification.

At 50× magnification with a numerical aperture of 0.50, this objective delivers high resolution for detailed observation of fine structures, microstructures, and surface features. The semi-apochromatic optical design provides superior color correction across the visible spectrum, ensuring accurate color rendition and high-contrast imaging essential for photomicrography, digital documentation, and quantitative image analysis.

The LMPLFLN (Long Working Distance M Plan Fluorite) optical system represents Olympus's advanced plan fluorite technology optimized for extended working distances. Despite the long working distance, this objective maintains flat-field imaging with minimal curvature of field, ensuring sharp focus from the center to the edge of the field of view. This is critical for photomicrography, image stitching, and quantitative image analysis where consistent focus across the entire viewing area is essential.

The combination of high magnification, long working distance, and dual contrast modes makes this objective uniquely capable for applications requiring detailed observation with specimen clearance and multiple imaging techniques. Switch seamlessly between brightfield and darkfield without changing objectives, improving workflow efficiency and enabling comprehensive sample characterization.

Designed for reflected light industrial microscopy, this objective features an M26 thread mount and is fully compatible with Olympus BX, GX, MX, and BHM series microscope systems. The robust construction and precision Japanese manufacturing ensure reliable performance in demanding production and research environments where the highest image quality, precision, and versatility are essential.

🔎 Typical Applications

• Thick specimen observation and high-magnification metallography
• Semiconductor wafer inspection and defect analysis
• Probe station measurements and micromanipulation
• Surface defect detection and scratch examination
• Precision optics and surface characterization
• Materials science and failure analysis

📊 Key Specifications

💼 University Purchase Orders Accepted

Thank you for viewing! Please contact us with any questions about this objective or your specific industrial microscopy requirements.