Olympus LMPLFLN-BD 20X Objective – Long Working Distance

Premium 20× long working distance objective with brightfield and darkfield capability — ideal for industrial inspection and materials science applications.

• 🔬 20× Magnification — Optimal balance of resolution and field of view for detailed surface inspection.
• 💡 Brightfield/Darkfield (BD) Capability — Dual-mode imaging for enhanced contrast and defect detection on reflective surfaces.
• 📏 Long Working Distance — 12mm. Extended clearance provides specimen safety and accommodates thicker samples or uneven surfaces.
• 🧠 LMPLFLN Plan Semi-Apochromat Design — Delivers flat-field imaging with excellent color correction across the visible spectrum.
• ⚙️ Industrial Reflected Light Compatibility — Designed for Olympus BX, GX, MX, and BHM series industrial microscopes.

🔧 Product Description

The Olympus LMPLFLN 20× BD Objective is a high-performance, long working distance objective engineered for demanding industrial microscopy applications. As part of Olympus's Plan semi-apochromat series, this objective combines extended working distance with dual brightfield/darkfield imaging capability, making it an essential tool for materials analysis, quality control, and failure analysis in manufacturing and research environments.

The brightfield/darkfield (BD) design allows you to switch between two complementary imaging modes without changing objectives. Brightfield mode provides standard reflected light imaging for general observation, while darkfield mode dramatically enhances contrast by illuminating the specimen at oblique angles — revealing surface defects, scratches, grain boundaries, and other features that would be invisible in brightfield alone.

The long working distance is a critical advantage when inspecting industrial samples, providing generous clearance for thick specimens, rough surfaces, or samples that require manipulation during observation. This extended working distance also reduces the risk of objective damage from contact with the specimen, protecting your investment in precision optics.

The LMPLFLN optical design ensures flat-field imaging with minimal distortion from center to edge, while the plan semi-apochromat correction delivers excellent color fidelity and chromatic aberration control. This combination makes the objective well-suited for both visual inspection and digital documentation of industrial samples.

Compatible with Olympus industrial reflected light microscope systems including the BX, GX, MX, and BHM series, this objective integrates seamlessly into metallurgical, semiconductor, and materials science workflows.

🔎 Typical Applications

• Metallurgical analysis and microstructure examination
• Semiconductor wafer and IC inspection
• Surface defect detection and quality control
• Failure analysis and forensic investigation
• Materials science research and characterization
• Precision manufacturing inspection

📊 Key Specifications

💼 University Purchase Orders Accepted

Thank you for viewing! Please contact us with any questions about this objective or your specific industrial microscopy requirements.