Olympus LMPLANFLN 10X LWD Objective (RMS, 21mm WD)

In stock

SKU: N2183200

Regular price $1,400.00
Sale price $1,400.00 Regular price $2,400.00 save $1,000.00
Premium 10Γ— semi-apochromatic objective with extra-long 21mm working distance β€” ideal for thick specimens, probe access, and applications requiring maximum clearance.

KEY FEATURES

  • 10Γ— Magnification, NA 0.25 β€” Balanced resolution and field of view for detailed observation.
  • Extra-Long Working Distance (21 mm) β€” Exceptional clearance for thick specimens, probe stations, and manipulation during observation.
  • Semi-Apochromatic Correction β€” Superior color correction and image quality across the visible spectrum.
  • Plan Fluorite (LMPLFLN) Optics β€” Flat-field imaging from center to edge for accurate documentation.
  • Infinity Corrected β€” Modern optical design for compatibility with advanced microscopy techniques.
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Product Overview

The Olympus LMPLFLN 10Γ— Objective is a specialized extra-long working distance semi-apochromatic lens engineered for applications requiring exceptional specimen clearance. With an impressive 21 mm working distance β€” more than double that of standard objectives β€” this lens provides the space needed for thick samples, probe-based measurements, environmental chambers, and any application where maximum clearance is essential.

Extra-long working distance objectives are critical for advanced microscopy applications that standard objectives simply cannot accommodate. The 21 mm clearance allows you to work with very thick specimens, uneven or irregular surfaces, samples requiring heating or cooling stages, probe stations for electrical measurements, micromanipulators, or any setup where accessories must be positioned near the sample surface. This generous space also virtually eliminates the risk of objective damage from accidental contact with the specimen or stage.

Despite the extended working distance, this objective maintains excellent optical performance through Olympus's advanced LMPLFLN (Long Working Distance M Plan Fluorite) design. At 10Γ— magnification with a numerical aperture of 0.25, it delivers sharp resolution and a wide field of view for surveying large sample areas. The semi-apochromatic optical design provides superior color correction compared to achromatic objectives, ensuring accurate color rendition and high-contrast imaging across the visible spectrum.

The plan fluorite optical system ensures flat-field imaging with minimal curvature of field, maintaining sharp focus from the center to the edge of the field of view. This is critical for photomicrography, image stitching, and quantitative image analysis where consistent focus across the entire viewing area is essential.

As an infinity-corrected objective, this lens is designed for modern microscope systems where the image is formed at infinity, allowing the insertion of optical components such as filters, polarizers, or DIC prisms in the parallel light path without introducing aberrations. This makes it compatible with advanced contrast techniques and modular microscopy accessories.

Featuring a standard RMS thread mount, this objective is compatible with most upright research microscope systems, including Olympus BX, GX, MX, and BHM series microscopes. The robust construction and precision Japanese manufacturing ensure reliable performance in demanding production and research environments.

Technical Specifications

Magnification 10Γ—
Numerical Aperture (NA) 0.25
Working Distance 21 mm (Extra-Long)
Optical Design LMPLFLN (Extra-Long WD Semi-Apochromatic Plan Fluorite)
Field Flatness Plan (Flat-field)
Color Correction Semi-Apochromatic
Optical System Infinity Corrected
Thread Mount RMS (20.32 x 36 TPI)
Application Industrial Reflected Light Microscopy
Compatibility Olympus BX, GX, MX, BHM series microscopes
SKU N2183200
Condition Excellent (Flawless Optics)

Microscope Compatibility

Typical Applications

Thick specimen observation and metallography
Probe station measurements and electrical testing
Micromanipulation and sample manipulation during observation
Environmental chamber and heating/cooling stage applications
Semiconductor and MEMS device inspection
Materials science and industrial quality control
  • Designed for Mixed-Brand Lab Environments

    Olympus, Nikon, Zeiss, Leica components in one place

  • Quality-Verified New & Pre-Owned Equipment

    Professionally sourced and verified for performance

  • Backed by Spach Optics Warranty & Support

    Ideal for labs using multiple microscope platforms

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