Olympus LMPLFLN-BD 100X Objective – Brightfield/Darkfield LWD

Premium 100× semi-apochromatic objective with long working distance — ideal for maximum magnification observation requiring exceptional clearance and dual contrast capabilities.

• 🔬 100× Magnification, NA 0.80 — Ultra-high numerical aperture for exceptional resolution at maximum magnification.
• 📏 Long Working Distance (3.3 mm) — Exceptional clearance for thick specimens and reduced risk of sample contact.
• 🌓 Brightfield & Darkfield (BD) — Dual contrast modes for versatile observation and superior defect detection.
• ✨ Semi-Apochromatic Correction — Superior color correction and image quality across the visible spectrum.
• 🎯 Plan Fluorite (LMPLFLN) Optics — Flat-field imaging from center to edge for accurate documentation.

🔧 Product Description

The Olympus LMPLFLN-BD 100× Objective is a specialized long working distance semi-apochromatic lens engineered for maximum magnification applications requiring both exceptional specimen clearance and dual contrast capability. Combining 100× magnification, 3.3 mm working distance, and brightfield/darkfield modes in a single objective, this lens is an essential tool for demanding industrial microscopy and materials analysis.

Long working distance objectives at maximum magnification are critical for advanced microscopy applications that standard 100× objectives simply cannot accommodate. The 3.3 mm clearance allows you to work with thick specimens, uneven surfaces, samples requiring environmental chambers, probe stations for electrical measurements, micromanipulators, or any setup where accessories must be positioned near the sample surface. This generous space also virtually eliminates the risk of objective damage from accidental contact with the specimen or stage.

The dual brightfield/darkfield capability makes this objective exceptionally versatile for industrial inspection and quality control at maximum magnification. Brightfield illumination provides standard observation for general sample characterization, while darkfield reveals surface defects, scratches, contamination, and structural irregularities with exceptional contrast. Features invisible in brightfield become dramatically visible in darkfield, making this objective invaluable for semiconductor wafer inspection, precision machining quality control, and surface defect analysis at the highest magnification.

At 100× magnification with a numerical aperture of 0.80, this objective delivers ultra-high resolution for detailed observation of the finest structures, microstructures, and surface features. The semi-apochromatic optical design provides superior color correction across the visible spectrum, ensuring accurate color rendition and high-contrast imaging essential for photomicrography, digital documentation, and quantitative image analysis at maximum magnification.

The LMPLFLN (Long Working Distance M Plan Fluorite) optical system represents Olympus's advanced plan fluorite technology optimized for extended working distances. Despite the long working distance, this objective maintains flat-field imaging with minimal curvature of field, ensuring sharp focus from the center to the edge of the field of view. This is critical for photomicrography, image stitching, and quantitative image analysis at high magnification.

The combination of 100× magnification, long working distance, and dual contrast modes makes this objective uniquely capable for applications requiring detailed observation with specimen clearance and multiple imaging techniques. Switch seamlessly between brightfield and darkfield without changing objectives, improving workflow efficiency and enabling comprehensive sample characterization at maximum magnification.

Designed for reflected light industrial microscopy, this objective features an M26 thread mount and is fully compatible with Olympus BX, GX, MX, and BHM series microscope systems. The robust construction and precision Japanese manufacturing ensure reliable performance in demanding production and research environments where maximum magnification with extended working distance and versatile contrast capabilities are essential.

🔎 Typical Applications

• Maximum magnification metallography with thick specimens
• Semiconductor wafer inspection and defect analysis
• Probe-based measurements and micromanipulation at high magnification
• Surface defect detection and characterization
• Materials science and submicron feature observation
• Advanced research requiring maximum magnification with clearance

📊 Key Specifications

💼 University Purchase Orders Accepted

Thank you for viewing! Please contact us with any questions about this objective or your specific industrial microscopy requirements.