Olympus LMPLANFL 100x/0.80 Brightfield & Darkfield Long Working Distance Objective (NA 0.80, Infinity, M26)

The Olympus LMPLANFL 100×/0.80 Brightfield & Darkfield Long Working Distance Objective is a specialized reflected light objective from Olympus’s LMPLANFL series — delivering an exceptional 3.3mm working distance at 100× with dual brightfield and darkfield capability for coverslip-free inspection of opaque specimens including metals, semiconductors, ceramics, and polished surfaces. Offered here in excellent condition with flawless optics at significant savings versus the new list price.

• 📏 Long working distance: 3.3mm — exceptional clearance at 100× for imaging large, thick, or mounted specimens that standard 100× objectives cannot accommodate; standard 100× reflected light objectives typically offer 0.1–1.0mm of working distance
• 🔦 Dual brightfield & darkfield capability — a single objective supports both brightfield and darkfield reflected light imaging, enabling high-contrast surface defect detection and grain boundary visualization without changing objectives
• 🔬 NA 0.80 at 100× — high numerical aperture for excellent resolution and contrast in reflected light imaging of opaque specimens
• 🪨 Coverslip-free design — designed for direct specimen contact imaging without a coverslip, as required for metallographic and semiconductor inspection of polished surfaces
• ♾️ Infinity-corrected, M26 thread — compatible with Olympus BX, GX, MX, and BHM series industrial and materials microscopes
• 🇯🇵 Olympus quality, made in Japan — precision optical construction for consistent, high-efficiency light transmission and long service life
• ✅ Condition: Excellent — flawless optics — SKU 1-UN354

🔧 Product Description

The Olympus LMPLANFL 100×/0.80 is a purpose-built long working distance reflected light objective for industrial and materials science applications where both extended working clearance and darkfield capability are required at 100×. The 3.3mm working distance is exceptional for a 100× reflected light objective — standard 100× reflected light objectives typically offer 0.1–1.0mm of working distance, making them impractical for large wafers, thick substrates, mounted specimens, or components in fixtures. The LMPLANFL design provides both brightfield and darkfield reflected light capability from a single objective — brightfield for standard surface imaging and darkfield for high-contrast detection of surface defects, scratches, particles, and grain boundaries that are difficult to see in brightfield. The coverslip-free design is appropriate for direct inspection of polished metallographic specimens, semiconductor wafers, and other opaque surfaces where coverslip use is impractical. Compatible with Olympus BX, GX, MX, and BHM series industrial and materials microscopes with M26 thread nosepieces. This unit is offered in excellent condition with flawless optics at a significant discount to the new list price of $6,800. SKU 1-UN354.

🔎 Typical Applications

• Metallographic examination requiring both brightfield and darkfield at 100×
• Semiconductor wafer and die inspection with extended working clearance
• Surface defect detection and grain boundary visualization using darkfield
• Inspection of large, thick, or mounted specimens that standard 100× objectives cannot reach
• Ceramics, glass, and advanced materials surface inspection
• Any application requiring long working distance and darkfield capability at 100×

📊 Key Specifications

University and institutional purchase orders are welcome. Please contact us for invoicing and procurement documentation.