Olympus LMPLANFL 100x/0.80 Brightfield & Darkfield Long Working Distance Objective (NA 0.80, Infinity, M26)
Regular price
$3,300.00
Sale price
$3,300.00
Regular price
$6,800.00
save $3,500.00
The Olympus LMPLANFL 100×/0.80 Brightfield & Darkfield Long Working Distance Objective is a specialized reflected light objective from Olympus’s LMPLANFL series — delivering an exceptional 3.3mm working distance at 100× with dual brightfield and darkfield capability for coverslip-free inspection of opaque specimens including metals, semiconductors, ceramics, and polished surfaces. Offered here in excellent condition with flawless optics at significant savings versus the new list price.
KEY FEATURES
- Long working distance: 3.3mm — exceptional clearance at 100× for imaging large, thick, or mounted specimens that standard 100× objectives cannot accommodate; standard 100× reflected light objectives typically offer 0.1–1.0mm of working distance
- Dual brightfield & darkfield capability — a single objective supports both brightfield and darkfield reflected light imaging, enabling high-contrast surface defect detection and grain boundary visualization without changing objectives
- NA 0.80 at 100× — high numerical aperture for excellent resolution and contrast in reflected light imaging of opaque specimens
- 🪨 Coverslip-free design — designed for direct specimen contact imaging without a coverslip, as required for metallographic and semiconductor inspection of polished surfaces
- Infinity-corrected, M26 thread — compatible with Olympus BX, GX, MX, and BHM series industrial and materials microscopes
- 🇯🇵 Olympus quality, made in Japan — precision optical construction for consistent, high-efficiency light transmission and long service life
- Condition: Excellent — flawless optics — SKU 1-UN354
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Technical Specifications
| SKU | 1-UN354 |
| Magnification | 100× |
| Numerical Aperture (NA) | 0.80 |
| Immersion Medium | Dry (air, no coverslip) |
| Working Distance | 3.3mm (LWD) |
| Illumination / Contrast | Brightfield & Darkfield reflected light |
| Coverslip | None (coverslip-free design) |
| Optical Design | LMPLANFL (Long WD, Plan, Fluorite) |
| Correction | Infinity-corrected |
| Thread / Mount | M26 |
| Compatible Microscopes | Olympus BX, GX, MX, BHM series industrial/materials microscopes |
| Country of Origin | Japan |
| Condition | Excellent — flawless optics |
Microscope Compatibility
Typical Applications
Metallographic examination requiring both brightfield and darkfield at 100×
Semiconductor wafer and die inspection with extended working clearance
Surface defect detection and grain boundary visualization using darkfield
Inspection of large, thick, or mounted specimens that standard 100× objectives cannot reach
Ceramics, glass, and advanced materials surface inspection
Any application requiring long working distance and darkfield capability at 100×
