Spach Optics, Inc.

Olympus LMPlanApo 250x/0.90 Brightfield & Darkfield Long Working Distance Objective (NA 0.90, Infinity, M26)

Regular price $2,800.00
Sale price $2,800.00 Regular price $5,800.00 save $3,000.00

SKU: LMPLAPO250XBD

In stock
Request a Quote
2-Year Warranty

Full coverage

Expert Support

Technical help

The Olympus LMPlanApo 250×/0.90 Brightfield & Darkfield Long Working Distance Objective is the highest magnification objective Olympus produces for reflected light microscopy — delivering 250× magnification with dual brightfield and darkfield capability, plan apochromat correction, and a 0.8mm working distance for the most demanding high-magnification surface inspection applications in semiconductor, metallographic, and advanced materials microscopy. Offered here new at significant savings versus the list price.

  • 🏆 Highest power Olympus reflected light objective — the LMPlanApo 250× is the highest magnification objective in the Olympus reflected light lineup, providing the ultimate resolving power for sub-micron feature inspection on opaque specimens
  • 🔦 Dual brightfield & darkfield (BD) capability — a single objective supports both brightfield and darkfield reflected light imaging; darkfield delivers high-contrast detection of surface defects, scratches, grain boundaries, and fine topographic features that are invisible or poorly contrasted in brightfield at 250×
  • 🔬 NA 0.90 at 250× — high numerical aperture for maximum resolution at this magnification, enabling visualization of the finest microstructural details and sub-micron surface features
  • 📏 Long working distance: 0.8mm — generous clearance for a 250× objective, providing practical working room for specimen manipulation and stage movement
  • 🌟 Plan apochromat (LMPlanApo) correction — Olympus plan apochromat correction for flat-field imaging with accurate chromatic registration across the full visible spectrum, essential for accurate documentation and color-based analysis at extreme magnification
  • ♾️ Infinity-corrected, M26 thread — compatible with Olympus BX, GX, MX, and BHM series industrial and materials microscopes
  • 🇯🇵 Olympus quality, made in Japan — precision optical construction for consistent, high-efficiency light transmission and long service life
  • Condition: New — SKU LMPLAPO250XBD

🔧 Product Description

The Olympus LMPlanApo 250×/0.90 BD is the pinnacle of Olympus’s reflected light objective lineup — the highest magnification objective the company produces for reflected light microscopy, designed for the most demanding sub-micron surface inspection applications in semiconductor, metallographic, and advanced materials science. At 250× with NA 0.90, this objective delivers the maximum resolving power available in Olympus reflected light microscopy, enabling visualization of features and defects that are beyond the resolution limit of lower-magnification objectives. The BD (Brightfield/Darkfield) design supports both illumination modes from a single objective — brightfield for standard surface imaging and darkfield for high-contrast detection of surface topography, scratches, etchings, grain boundaries, and thin film defects that scatter light differently from the surrounding surface. At 250×, darkfield imaging reveals surface features at a level of detail that is simply not achievable at lower magnifications. The plan apochromat correction ensures flat-field imaging with accurate chromatic registration across the full visible spectrum, essential for reliable color-based defect analysis and documentation at extreme magnification. The 0.8mm working distance is practical for a 250× objective, providing sufficient clearance for specimen manipulation. Compatible with Olympus BX, GX, MX, and BHM series industrial and materials microscopes with M26 thread nosepieces. Supplied new from stock, SKU LMPLAPO250XBD.


🔎 Typical Applications

  • Semiconductor wafer and IC inspection at maximum magnification for sub-micron defect detection
  • Darkfield inspection of surface scratches, etchings, and grain boundaries at 250×
  • High-magnification metallographic examination of fine grain structure and microfeatures
  • Thin film and coating defect analysis requiring maximum resolving power
  • Advanced materials surface inspection at the resolution limit of optical microscopy
  • Any application requiring the highest magnification available in Olympus reflected light microscopy

📊 Key Specifications

Specification Details
SKU LMPLAPO250XBD
Magnification 250×
Numerical Aperture (NA) 0.90
Immersion Medium Dry (air, no coverslip)
Working Distance 0.8mm (LWD)
Illumination / Contrast Brightfield & Darkfield reflected light (BD)
Optical Design LMPlanApo BD (Plan Apochromat, LWD, BD)
Correction Infinity-corrected
Thread / Mount M26
Compatible Microscopes Olympus BX, GX, MX, BHM series industrial/materials microscopes
Country of Origin Japan
Condition New

University and institutional purchase orders are welcome. Please contact us for invoicing and procurement documentation.

Request a Quote