Olympus LCPLFLN50XLCD 50X Objective – LCD Long Working Distance

Specialized 50× semi-apochromatic objective optimized for LCD and glass substrate inspection — ideal for display panel analysis, semiconductor inspection through glass, and applications requiring observation through varying glass thicknesses.

• 🔬 50× Magnification, NA 0.70 — High numerical aperture for excellent resolution through glass substrates.
• 📏 Long Working Distance (2.2-3.0 mm) — Generous clearance for thick glass substrates and LCD panels.
• 🔧 Correction Collar (0-1.2 mm) — Adjustable optical correction for varying glass substrate thicknesses.
• ✨ Semi-Apochromatic Correction — Superior color correction and image quality across the visible spectrum.
• ♾️ Infinity Corrected — Modern optical design for compatibility with advanced microscopy techniques.

🔧 Product Description

The Olympus LCPLFLN50XLCD 50× Objective is a specialized semi-apochromatic lens engineered specifically for observation through glass substrates such as LCD panels, display screens, and semiconductor devices with protective glass layers. This unique objective combines high numerical aperture, long working distance, and adjustable optical correction to deliver exceptional image quality when observing samples through varying thicknesses of glass.

LCD and display panel inspection presents unique optical challenges. When observing through glass substrates, spherical aberration degrades image quality and resolution. The LCPLFLN series solves this problem with an adjustable correction collar that compensates for glass thickness from 0 to 1.2 mm. By adjusting the collar to match your substrate thickness, you restore optimal optical performance and achieve sharp, high-contrast images through the glass.

At 50× magnification with a 0.70 numerical aperture, this objective delivers high resolution for detailed observation of LCD pixels, TFT structures, defects, and other fine features. The high NA provides excellent light-gathering capability and resolution even when working through glass substrates, revealing details that would be lost with standard objectives.

The long working distance of 2.2-3.0 mm (depending on correction collar setting) provides generous clearance for thick glass substrates and LCD panels. This extended working distance allows you to observe samples through protective glass layers while maintaining adequate space between the objective and the glass surface, reducing the risk of contact damage to both the objective and the sample.

The semi-apochromatic optical design delivers superior color correction across the visible spectrum, ensuring accurate color rendition and high-contrast imaging essential for LCD color filter inspection, display quality analysis, and photomicrography. The plan fluorite construction provides flat-field imaging with minimal curvature of field, maintaining sharp focus from the center to the edge of the field of view.

As an infinity-corrected objective, this lens is designed for modern microscope systems where the image is formed at infinity, allowing the insertion of optical components such as filters, polarizers, or DIC prisms in the parallel light path without introducing aberrations. This makes it compatible with advanced contrast techniques and modular microscopy accessories.

Featuring a standard RMS thread mount, this objective is compatible with most upright research microscope systems, including Olympus BX, GX, MX, and BHM series microscopes. The robust construction and precision Japanese manufacturing ensure reliable performance in demanding production and research environments where LCD and display inspection is critical.

🔎 Typical Applications

• LCD panel and display screen inspection
• TFT structure and pixel defect analysis
• Observation through glass substrates and protective layers
• Semiconductor device inspection through glass
• Display quality control and failure analysis
• Color filter and optical component inspection

📊 Key Specifications

💼 University Purchase Orders Accepted

Thank you for viewing! Please contact us with any questions about this objective or your specific industrial microscopy requirements.