Olympus LCPLFLN100XLCD 100X Objective – LCD Long Working Distance

The Olympus LCPLFLN100XLCD 100× Objective is a specialized semi-apochromatic lens engineered specifically for observation through glass substrates such as LCD panels, display screens, and semiconductor devices with protective glass layers at maximum magnification. This unique objective combines ultra-high numerical aperture, long working distance, and adjustable optical correction to deliver exceptional image quality when observing samples through varying thicknesses of glass at 100× magnification.

LCD and display panel inspection at high magnification presents unique optical challenges. When observing through glass substrates, spherical aberration degrades image quality and resolution. The LCPLFLN series solves this problem with an adjustable correction collar that compensates for glass thickness from 0 to 0.7 mm. By adjusting the collar to match your substrate thickness, you restore optimal optical performance and achieve sharp, high-contrast images through the glass at maximum magnification.

At 100× magnification with a 0.85 numerical aperture, this objective delivers ultra-high resolution for detailed observation of LCD pixels, TFT structures, defects, and other ultra-fine features. The high NA provides exceptional light-gathering capability and resolution even when working through glass substrates, revealing submicron details that would be lost with standard objectives. This makes it ideal for failure analysis and defect characterization at the highest magnification.

The long working distance of 0.9-1.2 mm (depending on correction collar setting) provides good clearance for glass substrates and LCD panels at 100× magnification. This working distance allows you to observe samples through protective glass layers while maintaining adequate space between the objective and the glass surface, reducing the risk of contact damage to both the objective and the sample.

The semi-apochromatic optical design delivers superior color correction across the visible spectrum, ensuring accurate color rendition and high-contrast imaging essential for LCD color filter inspection, display quality analysis, and photomicrography at maximum magnification. The plan fluorite construction provides flat-field imaging with minimal curvature of field, maintaining sharp focus from the center to the edge of the field of view.

As an infinity-corrected objective, this lens is designed for modern microscope systems where the image is formed at infinity, allowing the insertion of optical components such as filters, polarizers, or DIC prisms in the parallel light path without introducing aberrations. This makes it compatible with advanced contrast techniques and modular microscopy accessories.

Featuring a standard RMS thread mount, this objective is compatible with most upright research microscope systems, including Olympus BX, GX, MX, and BHM series microscopes. The robust construction and precision Japanese manufacturing ensure reliable performance in demanding production and research environments where LCD and display inspection at maximum magnification is critical.