Spach Optics, Inc.

Olympus LCPlan N 50X IR Objective | 0.65 NA Near-Infrared, Infinity Corrected

Regular price $7,400.00
Sale price $7,400.00 Regular price $8,100.00 save $700.00

SKU: N2739000

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Advanced 50ร— NIR objective with long working distance and broad spectral transmission.

  • ๐Ÿ”ฌ 50ร— Magnification, NA 0.65 โ€” Strong resolution and light collection for detailed imaging.
  • ๐ŸŒˆ Near-Infrared Optimized (700โ€“1600 nm) โ€” Excellent transmission for IR microscopy and inspection.
  • ๐Ÿง  Plan Achromat Optical Design โ€” Flat field and reduced aberrations across wavebands.
  • ๐Ÿ“ Long Working Distance (~4.5 mm) โ€” Space for thicker samples and tools during inspection.
  • โš™๏ธ Standard RMS Thread Mount โ€” Compatible with typical research microscopes.

Why Use IR Objectives Instead of Standard Objectives?

Standard microscope objectives are optimized for visible light and perform poorly in near-infrared applications.

Olympus IR objectives:

  • Deliver higher transmission in NIR wavelengths
  • Improve contrast in silicon and semiconductor materials
  • Enable imaging beneath surfaces not visible with standard optics

๐Ÿ‘‰ This makes them essential for inspection, electronics, and advanced materials analysis

๐Ÿงช Product Description

The Olympus LCPLN50XIR 50ร— NIR Objective is a specialized microscope objective designed for advanced imaging that spans both the visible and near-infrared (NIR) spectral range (700โ€“1600 nm). This makes it an excellent choice for applications that require high transmission and detailed contrast beyond the visible spectrum, such as near-IR microscopy and industrial inspection workflows where subsurface features must be observed.

With 50ร— magnification and a numerical aperture (NA) of 0.65, this objective strikes an effective balance between resolution and light gathering capability. The Plan Achromat optical design minimizes chromatic and spherical aberrations, delivering consistently clear images with high contrast from center to edge โ€” whether imaging brightfield, IR, or multi-modal techniques.

A key feature of this objective is its long working distance (approximately 4.5 mm), which reduces the risk of specimen or substrate damage and provides extra space for thicker samples, sample holders, or inspection tools. This is particularly important in industrial microscopy, materials science, and semiconductor inspection applications.

The standard RMS threaded mount ensures compatibility with a wide range of upright research microscope systems used in laboratories and inspection suites around the world.


๐Ÿ”Ž Typical Applications

  • Near-infrared (700โ€“1600 nm) microscopy
  • Silicon wafer and semiconductor inspection
  • Visible + IR imaging workflows
  • Materials science and inspection labs
  • Flat-field measurement and documentation

๐Ÿ“Š Key Specifications

Specification

Details

Magnification

50ร—

Numerical Aperture (NA)

0.65

Optical Design

Plan Achromat

Wavelength Range

Visible to Near-IR (700โ€“1600 nm)

Working Distance

~4.50 mm (typical)

Field Number

~22 mm

Thread

RMS (20.32 ร— 36 TPI)

Compatible Cover Glass

0 โ€“ 1.2 mm (glass or silicon correction collar)

Parfocal Length

~45 mm

Condition

New

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