Olympus IX Inverted Reflected Light Industrial Microscope - DIC, BF, Pol

The Olympus IX inverted metallurgical microscope is a high-performance reflected light platform designed for industrial materials science, semiconductor inspection, and failure analysis applications. The inverted configuration places the objectives below the stage, allowing large, heavy, or irregularly shaped specimens — such as wafers, metal billets, and mounted cross-sections — to be placed flat on the stage without height constraints. This system is equipped with a full complement of five UMPlanFL infinity-corrected objectives spanning 5x through 100x, covering the complete magnification range needed for macro survey through high-resolution surface detail. The U-DICR Nomarski DIC slider adds differential interference contrast capability, revealing surface topography, grain boundaries, and thin film features with exceptional three-dimensional contrast. The polarized light filter cube enables grain structure analysis, stress birefringence imaging, and identification of anisotropic materials. A 4-position filter turret with brightfield cube, vertical illuminator with iris, 12V/100W lamphouse and power supply, left-hand mechanical XY stage, 10x widefield eyepieces, and 1x C-mount camera port complete this turnkey system. Custom configurations are available upon request.