Olympus GX51 Inverted Reflected Light Microscope - DIC, BF, DF, Pol

The Olympus GX51 Inverted Metallurgical Microscope is a premium, fully configured industrial reflected light system equipped with brightfield/darkfield objectives, DIC/Nomarski, a full polarization set with 360° rotatable analyzer, and a 0.5x C-mount camera port — one of the most capable inverted metallograph platforms available for advanced materials characterization.

• 🔬 5-objective BF/DF set — UMPlanFL 5x, 10x, 20x and LMPlanFL LWD 50x, 100x — all brightfield/darkfield capable
• 🌈 DIC/Nomarski — U-DICR prism slider for high-contrast surface topography and thin film imaging
• 🔵 Full polarization system — GX-PO polarizer and GX-AN360 360° rotatable analyzer for grain and anisotropy analysis
• 🔦 BF/DF vertical illuminator — switchable brightfield and darkfield illumination in a single illuminator
• 📷 Camera ready — GX-TV0.5XC 0.5x C-mount adapter for wide-field digital documentation
• 📍 Right-hand mechanical XY stage — precise specimen positioning for large sample navigation
• ✨ Excellent condition, as-new performance — professionally verified
• ⚙️ Custom configurations available — contact us to modify the setup for your application
• 🎓 University purchase orders accepted

🔧 Product Description

The Olympus GX51 is the flagship inverted metallurgical microscope in the Olympus industrial lineup, designed for the most demanding materials science, semiconductor, and failure analysis applications. Its inverted configuration places objectives below the stage, enabling large, heavy, or irregularly shaped specimens — metal billets, wafers, mounted cross-sections, and bulk samples — to rest flat without height restrictions. This system is configured with five UMPlanFL and LMPlanFL LWD objectives spanning 5x through 100x, all capable of both brightfield and darkfield illumination — allowing seamless switching between contrast modes without changing objectives. The U-DICR DIC/Nomarski prism slider adds differential interference contrast for revealing surface topography, grain boundaries, and thin film features with exceptional three-dimensional contrast. The full polarization system — GX-PO polarizer and GX-AN360 360° rotatable analyzer — enables grain structure analysis, stress birefringence, and identification of anisotropic phases. The GX-TV0.5XC 0.5x C-mount adapter provides a wide field of view for camera documentation. The GX51 platform is known for its exceptional mechanical stability, ergonomic design, and expandability. Custom configurations are available upon request.

🔎 Typical Applications

• Metallographic analysis of grain structure, phase distribution, and inclusions in metals and alloys
• Semiconductor wafer and device inspection using brightfield, darkfield, and DIC contrast
• Failure analysis and surface defect characterization on bulk and mounted specimens
• Thin film, coating, and surface finish inspection with DIC/Nomarski contrast
• Polarized light analysis of anisotropic materials, stress birefringence, and crystal orientation

📊 Key Specifications

Custom configurations are available upon request. University and institutional customers are welcome to submit purchase orders. Please contact us for net terms, procurement documentation, or application-specific configuration advice.