Olympus GX51 Inverted Reflected Light Microscope - DIC, BF, DF, Pol

The Olympus GX51 is the flagship inverted metallurgical microscope in the Olympus industrial lineup, designed for the most demanding materials science, semiconductor, and failure analysis applications. Its inverted configuration places objectives below the stage, enabling large, heavy, or irregularly shaped specimens — metal billets, wafers, mounted cross-sections, and bulk samples — to rest flat without height restrictions. This system is configured with five UMPlanFL and LMPlanFL LWD objectives spanning 5x through 100x, all capable of both brightfield and darkfield illumination — allowing seamless switching between contrast modes without changing objectives. The U-DICR DIC/Nomarski prism slider adds differential interference contrast for revealing surface topography, grain boundaries, and thin film features with exceptional three-dimensional contrast. The full polarization system — GX-PO polarizer and GX-AN360 360° rotatable analyzer — enables grain structure analysis, stress birefringence, and identification of anisotropic phases. The GX-TV0.5XC 0.5x C-mount adapter provides a wide field of view for camera documentation. The GX51 platform is known for its exceptional mechanical stability, ergonomic design, and expandability. Custom configurations are available upon request.