Nikon TU Plan Fluor 100x Objective
Nikon TU Plan Fluor 100x Objective

Nikon TU Plan Fluor 100x Objective

In stock

SKU: MUE12900

$2,200.00
$2,200.00 $3,300.00 save $1,100.00
The Nikon TU Plan Fluor 100x Reflected Light Objective is a high-performance infinity-corrected objective delivering exceptional resolution for EPI (reflected light) microscopy. With a N.A. of 0.90 and 1mm working distance, it resolves fine surface features with outstanding contrast — ideal for demanding industrial inspection, semiconductor analysis, and materials science applications. This unit is a demonstration model in flawless optical condition, offered at significant savings over new pricing.

KEY FEATURES

  • 100x magnification with N.A. 0.90 for maximum dry-objective resolution
  • EPI (reflected light) design for opaque and surface-level specimen inspection
  • Plan Fluor optical correction for flat, high-transmission field across visible wavelengths
  • M25 thread, infinity-corrected — compatible with Nikon infinity-corrected microscopes
  • Demonstration model — flawless optics, inspected and verified
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Product Overview

The Nikon TU Plan Fluor 100x (catalog no. MUE12900) is part of Nikon's TU Plan series of reflected-light objectives, engineered for high-NA surface imaging on opaque specimens. At N.A. 0.90, it sits at the top of the dry objective range, delivering the resolving power needed to characterize fine surface structures, defects, and microfeatures. The Plan Fluor optical design ensures excellent field flatness and strong transmission across the visible spectrum, supporting both visual inspection and camera-based imaging workflows. With an M25 thread and infinity-corrected design, it integrates directly with Nikon's broad range of infinity-corrected upright and industrial microscopes. This listing is for a demonstration model in flawless optical condition — a rare opportunity to acquire a premium Nikon objective at well below new cost.

Technical Specifications

Manufacturer Nikon
Model / Part Number TU Plan Fluor 100x / MUE12900
Magnification 100x
Numerical Aperture (N.A.) 0.90
Working Distance (W.D.) 1.0 mm
Thread M25
Optical System Infinity-Corrected
Illumination Type EPI (Reflected Light)
Optical Correction Plan Fluor
Immersion Medium Dry (Air)
Condition Demonstration Model — Flawless Optics
Country of Origin Japan

Microscope Compatibility

Typical Applications

Semiconductor wafer and die defect inspection at high magnification
PCB trace, via, and solder joint analysis
Metallurgical microstructure and surface finish examination
MEMS and microelectronics surface characterization
Precision component quality control and failure analysis
Materials science surface imaging

  • Designed for Mixed-Brand Lab Environments

    Olympus, Nikon, Zeiss, Leica components in one place

  • Quality-Verified New & Pre-Owned Equipment

    Professionally sourced and verified for performance

  • Backed by Spach Optics Warranty & Support

    Ideal for labs using multiple microscope platforms

  • Fast, Reliable U.S. Shipping

    Most orders ship quickly from within the United States

  • Expert Support from Optical Specialists

    Guidance on compatibility, selection, and configuration