Nikon TU Plan ELWD 50x Brightfield Darkfield Objective

The Nikon TU Plan ELWD 50x/0.60 EPI D objective represents the pinnacle of industrial microscopy optics, combining extra-long working distance with dual brightfield/darkfield capability. With an extraordinary 11mm working distance—more than 50 times longer than typical 50x objectives—this lens excels in applications requiring clearance for thick specimens, measurement probes, micromanipulation tools, or inspection of components with complex surface topography.

The integrated EPI D (episcopic darkfield) capability enables high-contrast visualization of surface defects, scratches, contamination, and fine structural details that remain invisible under conventional brightfield illumination. This dual-mode functionality makes the objective invaluable for quality control inspection, failure analysis, and materials characterization where both general observation and defect detection are required. The 0.60 numerical aperture delivers excellent resolution while maintaining the extended working distance.

Engineered for Nikon's TU Plan series, this infinity-corrected objective features the robust 32mm thread standard used in industrial microscopy systems. The plan-corrected optical design ensures edge-to-edge sharpness across the entire field of view, critical for accurate measurement and documentation. This objective has seen only light use and features flawless optics, delivering performance indistinguishable from new at less than half the original cost. SKU: MUE61500.