Nikon TU Plan ELWD 50x Brightfield Darkfield Objective

Nikon TU Plan ELWD 50x/0.60 EPI D Objective - Extra Long Working Distance

🔬 Exceptional 11mm working distance - ideal for thick specimens and inspection tasks
🎯 Dual-mode capability: brightfield and darkfield (EPI D) illumination
♻️ Infinity-corrected optics for modern Nikon industrial microscope systems
✨ Optics are flawless. Light signs of use on outer metal barrel - save 52% vs. new list price of $4,995

🔧 Product Description

The Nikon TU Plan ELWD 50x/0.60 EPI D objective represents the pinnacle of industrial microscopy optics, combining extra-long working distance with dual brightfield/darkfield capability. With an extraordinary 11mm working distance—more than 50 times longer than typical 50x objectives—this lens excels in applications requiring clearance for thick specimens, measurement probes, micromanipulation tools, or inspection of components with complex surface topography.

The integrated EPI D (episcopic darkfield) capability enables high-contrast visualization of surface defects, scratches, contamination, and fine structural details that remain invisible under conventional brightfield illumination. This dual-mode functionality makes the objective invaluable for quality control inspection, failure analysis, and materials characterization where both general observation and defect detection are required. The 0.60 numerical aperture delivers excellent resolution while maintaining the extended working distance.

Engineered for Nikon's TU Plan series, this infinity-corrected objective features the robust 32mm thread standard used in industrial microscopy systems. The plan-corrected optical design ensures edge-to-edge sharpness across the entire field of view, critical for accurate measurement and documentation. This objective has seen only light use and features flawless optics, delivering performance indistinguishable from new at less than half the original cost. SKU: MUE61500.

🔎 Typical Applications

• Semiconductor wafer and die inspection
• PCB (printed circuit board) quality control and failure analysis
• Surface defect detection in precision manufacturing
• Materials science and metallography with thick specimens
• MEMS and microelectronics inspection
• Optical component surface characterization
• Industrial quality control requiring extended working clearance
• Research applications with micromanipulation or probing requirements

📊 Key Specifications

University purchase orders accepted. Contact us for compatibility verification with your Nikon microscope system, technical specifications, or institutional pricing.