Nikon T Plan SLWD 50x Objective
SKU: MUE31500
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The Nikon CFI60-2 T Plan Fluor EPI SLWD 50x Objective is a high-magnification Super Long Working Distance (SLWD) objective designed for reflected-light (EPI) microscopy where both elevated magnification and generous clearance are required. With a 22mm working distance and N.A. 0.4, it delivers detailed surface imaging on large, bulky, or fixture-mounted specimens without risk of contact.
- 🔬 50x magnification with N.A. 0.4 for high-resolution surface detail
- 📏 22mm Super Long Working Distance — exceptional clearance for industrial specimens
- 💡 EPI (reflected light) design for opaque and surface-level inspection
- 🏭 Plan Fluor optical correction for flat, uniform field across the full image area
- 🔩 CFI60-2 infinity-corrected system — compatible with Nikon industrial and upright microscopes
🔧 Product Description
The Nikon CFI60-2 T Plan Fluor EPI SLWD 50x bridges the gap between high magnification and practical working clearance — a combination rarely achieved in standard objectives. Its 22mm working distance far exceeds what conventional 50x objectives offer, enabling detailed inspection of components inside housings, wafers in carriers, or specimens under environmental stages. The Plan Fluor optical design provides excellent field flatness and strong transmission across visible wavelengths, supporting both visual inspection and high-resolution camera imaging. As part of Nikon's CFI60-2 infinity-corrected platform, it integrates directly with Nikon's LV, MM, and Eclipse industrial series microscopes.
🔎 Typical Applications
- Semiconductor wafer and die surface inspection at high magnification
- PCB trace and solder joint analysis
- Metallurgical surface examination and grain structure analysis
- Precision-machined part quality control
- Inspection of specimens inside enclosures or environmental chambers
- Failure analysis and defect characterization
📊 Key Specifications
| Specification | Details |
|---|---|
| Manufacturer | Nikon |
| Model / Part Number | CFI60-2 T Plan Fluor EPI SLWD 50x / MUE31500 |
| Magnification | 50x |
| Numerical Aperture (N.A.) | 0.4 |
| Working Distance (W.D.) | 22.0 mm |
| Optical System | CFI60-2 Infinity-Corrected |
| Illumination Type | EPI (Reflected Light) |
| Optical Correction | Plan Fluor |
| Working Distance Class | SLWD (Super Long Working Distance) |
| Immersion Medium | Dry (Air) |
| Country of Origin | Japan |
University and institutional customers are welcome to submit a purchase order. Please contact us for net terms and academic pricing.
