Nikon T Plan SLWD 50x Objective

In stock

SKU: MUE31500

$4,400.00
The Nikon CFI60-2 T Plan Fluor EPI SLWD 50x Objective is a high-magnification Super Long Working Distance (SLWD) objective designed for reflected-light (EPI) microscopy where both elevated magnification and generous clearance are required. With a 22mm working distance and N.A. 0.4, it delivers detailed surface imaging on large, bulky, or fixture-mounted specimens without risk of contact.

KEY FEATURES

  • 50x magnification with N.A. 0.4 for high-resolution surface detail
  • 22mm Super Long Working Distance — exceptional clearance for industrial specimens
  • EPI (reflected light) design for opaque and surface-level inspection
  • Plan Fluor optical correction for flat, uniform field across the full image area
  • CFI60-2 infinity-corrected system — compatible with Nikon industrial and upright microscopes
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Product Overview

The Nikon CFI60-2 T Plan Fluor EPI SLWD 50x bridges the gap between high magnification and practical working clearance — a combination rarely achieved in standard objectives. Its 22mm working distance far exceeds what conventional 50x objectives offer, enabling detailed inspection of components inside housings, wafers in carriers, or specimens under environmental stages. The Plan Fluor optical design provides excellent field flatness and strong transmission across visible wavelengths, supporting both visual inspection and high-resolution camera imaging. As part of Nikon's CFI60-2 infinity-corrected platform, it integrates directly with Nikon's LV, MM, and Eclipse industrial series microscopes.

Technical Specifications

Manufacturer Nikon
Model / Part Number CFI60-2 T Plan Fluor EPI SLWD 50x / MUE31500
Magnification 50x
Numerical Aperture (N.A.) 0.4
Working Distance (W.D.) 22.0 mm
Optical System CFI60-2 Infinity-Corrected
Illumination Type EPI (Reflected Light)
Optical Correction Plan Fluor
Working Distance Class SLWD (Super Long Working Distance)
Immersion Medium Dry (Air)
Country of Origin Japan

Microscope Compatibility

Typical Applications

Semiconductor wafer and die surface inspection at high magnification
PCB trace and solder joint analysis
Metallurgical surface examination and grain structure analysis
Precision-machined part quality control
Inspection of specimens inside enclosures or environmental chambers
Failure analysis and defect characterization

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    Ideal for labs using multiple microscope platforms

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