Nikon T Plan SLWD 20x Objective

The Nikon CFI60-2 T Plan Fluor EPI SLWD 20x Objective is an exceptional Super Long Working Distance (SLWD) objective engineered for reflected-light (EPI) applications where extended clearance between the lens and specimen is critical. With a 30mm working distance and N.A. 0.3, it delivers sharp, high-contrast imaging even when working with large, bulky, or encased samples.

• 🔬 20x magnification with N.A. 0.3 for balanced resolution and field of view
• 📏 30mm Super Long Working Distance — ideal for large or enclosed specimens
• 💡 EPI (reflected light) design for surface and opaque sample inspection
• 🏭 Plan Fluor optical correction for flat, edge-to-edge field uniformity
• 🔩 CFI60-2 infinity-corrected system — compatible with Nikon industrial and upright microscopes

🔧 Product Description

The Nikon CFI60-2 T Plan Fluor EPI SLWD 20x is purpose-built for industrial and materials science microscopy where conventional objectives fall short. Its 30mm working distance — far exceeding standard objectives — allows inspection of components inside housings, wafers in carriers, or specimens under environmental chambers without risk of contact. The Plan Fluor optical design ensures excellent flatness of field and high transmission across visible wavelengths, making it equally effective for visual inspection and camera-based imaging. As part of Nikon's CFI60-2 infinity-corrected platform, it integrates seamlessly with Nikon's LV, MM, and Eclipse industrial series microscopes.

🔎 Typical Applications

• Semiconductor wafer and die inspection
• PCB and electronic component surface analysis
• Metallurgical and materials surface examination
• Quality control of precision-machined parts
• Inspection of specimens inside enclosures or fixtures
• Failure analysis and reverse engineering

📊 Key Specifications

University and institutional customers are welcome to submit a purchase order. Please contact us for net terms and academic pricing.