Nikon T Plan SLWD 100x Objective
Regular price
$7,995.00
The Nikon CFI60-2 T Plan Fluor EPI SLWD 100x Objective is a premium ultra-high-magnification Super Long Working Distance (SLWD) objective engineered for reflected-light (EPI) microscopy demanding both maximum magnification and exceptional working clearance. With a 10mm working distance and N.A. 0.6, it resolves fine surface features on large, bulky, or fixture-mounted specimens that would be inaccessible to conventional 100x objectives.
KEY FEATURES
- 100x magnification with N.A. 0.6 for ultra-high-resolution surface imaging
- 10mm Super Long Working Distance — far exceeding standard 100x dry objectives
- EPI (reflected light) design for opaque and surface-level specimen inspection
- Plan Fluor optical correction for flat, edge-to-edge field uniformity
- CFI60-2 infinity-corrected system — compatible with Nikon industrial and upright microscopes
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Technical Specifications
| Manufacturer | Nikon |
| Model / Part Number | CFI60-2 T Plan Fluor EPI SLWD 100x / MUE31900 |
| Magnification | 100x |
| Numerical Aperture (N.A.) | 0.6 |
| Working Distance (W.D.) | 10.0 mm |
| Optical System | CFI60-2 Infinity-Corrected |
| Illumination Type | EPI (Reflected Light) |
| Optical Correction | Plan Fluor |
| Working Distance Class | SLWD (Super Long Working Distance) |
| Immersion Medium | Dry (Air) |
| Country of Origin | Japan |
Microscope Compatibility
Typical Applications
High-magnification semiconductor wafer and die defect inspection
Fine PCB trace, via, and solder joint analysis
Metallurgical microstructure and surface finish examination
Precision component inspection inside enclosures or fixtures
Failure analysis and root cause investigation at high resolution
MEMS and microelectronics surface characterization
