Nikon T Plan SLWD 100x Objective

In stock

SKU: MUE31900

Regular price $7,995.00
The Nikon CFI60-2 T Plan Fluor EPI SLWD 100x Objective is a premium ultra-high-magnification Super Long Working Distance (SLWD) objective engineered for reflected-light (EPI) microscopy demanding both maximum magnification and exceptional working clearance. With a 10mm working distance and N.A. 0.6, it resolves fine surface features on large, bulky, or fixture-mounted specimens that would be inaccessible to conventional 100x objectives.

KEY FEATURES

  • 100x magnification with N.A. 0.6 for ultra-high-resolution surface imaging
  • 10mm Super Long Working Distance — far exceeding standard 100x dry objectives
  • EPI (reflected light) design for opaque and surface-level specimen inspection
  • Plan Fluor optical correction for flat, edge-to-edge field uniformity
  • CFI60-2 infinity-corrected system — compatible with Nikon industrial and upright microscopes
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Product Overview

The Nikon CFI60-2 T Plan Fluor EPI SLWD 100x is the top of the T Plan SLWD series, delivering 100x magnification with a 10mm working distance that is extraordinary for an objective in this class. Standard 100x dry objectives typically offer working distances of 0.1–0.3mm; this objective's 10mm clearance opens up entirely new inspection scenarios — from components inside deep housings to specimens under environmental stages or probing fixtures. The N.A. 0.6 provides strong resolving power for fine surface detail, while the Plan Fluor correction ensures a flat, uniformly illuminated field across the full image area. As part of Nikon's CFI60-2 infinity-corrected platform, it integrates seamlessly with Nikon's LV, MM, and Eclipse industrial series microscopes.

Technical Specifications

Manufacturer Nikon
Model / Part Number CFI60-2 T Plan Fluor EPI SLWD 100x / MUE31900
Magnification 100x
Numerical Aperture (N.A.) 0.6
Working Distance (W.D.) 10.0 mm
Optical System CFI60-2 Infinity-Corrected
Illumination Type EPI (Reflected Light)
Optical Correction Plan Fluor
Working Distance Class SLWD (Super Long Working Distance)
Immersion Medium Dry (Air)
Country of Origin Japan

Microscope Compatibility

Typical Applications

High-magnification semiconductor wafer and die defect inspection
Fine PCB trace, via, and solder joint analysis
Metallurgical microstructure and surface finish examination
Precision component inspection inside enclosures or fixtures
Failure analysis and root cause investigation at high resolution
MEMS and microelectronics surface characterization
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    Ideal for labs using multiple microscope platforms

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