Nikon T Plan SLWD 100x Objective
SKU: MUE31900
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The Nikon CFI60-2 T Plan Fluor EPI SLWD 100x Objective is a premium ultra-high-magnification Super Long Working Distance (SLWD) objective engineered for reflected-light (EPI) microscopy demanding both maximum magnification and exceptional working clearance. With a 10mm working distance and N.A. 0.6, it resolves fine surface features on large, bulky, or fixture-mounted specimens that would be inaccessible to conventional 100x objectives.
- 🔬 100x magnification with N.A. 0.6 for ultra-high-resolution surface imaging
- 📏 10mm Super Long Working Distance — far exceeding standard 100x dry objectives
- 💡 EPI (reflected light) design for opaque and surface-level specimen inspection
- 🏭 Plan Fluor optical correction for flat, edge-to-edge field uniformity
- 🔩 CFI60-2 infinity-corrected system — compatible with Nikon industrial and upright microscopes
🔧 Product Description
The Nikon CFI60-2 T Plan Fluor EPI SLWD 100x is the top of the T Plan SLWD series, delivering 100x magnification with a 10mm working distance that is extraordinary for an objective in this class. Standard 100x dry objectives typically offer working distances of 0.1–0.3mm; this objective's 10mm clearance opens up entirely new inspection scenarios — from components inside deep housings to specimens under environmental stages or probing fixtures. The N.A. 0.6 provides strong resolving power for fine surface detail, while the Plan Fluor correction ensures a flat, uniformly illuminated field across the full image area. As part of Nikon's CFI60-2 infinity-corrected platform, it integrates seamlessly with Nikon's LV, MM, and Eclipse industrial series microscopes.
🔎 Typical Applications
- High-magnification semiconductor wafer and die defect inspection
- Fine PCB trace, via, and solder joint analysis
- Metallurgical microstructure and surface finish examination
- Precision component inspection inside enclosures or fixtures
- Failure analysis and root cause investigation at high resolution
- MEMS and microelectronics surface characterization
📊 Key Specifications
| Specification | Details |
|---|---|
| Manufacturer | Nikon |
| Model / Part Number | CFI60-2 T Plan Fluor EPI SLWD 100x / MUE31900 |
| Magnification | 100x |
| Numerical Aperture (N.A.) | 0.6 |
| Working Distance (W.D.) | 10.0 mm |
| Optical System | CFI60-2 Infinity-Corrected |
| Illumination Type | EPI (Reflected Light) |
| Optical Correction | Plan Fluor |
| Working Distance Class | SLWD (Super Long Working Distance) |
| Immersion Medium | Dry (Air) |
| Country of Origin | Japan |
University and institutional customers are welcome to submit a purchase order. Please contact us for net terms and academic pricing.
