Nikon T Plan 2.5x EPI Reflected Light Objective (NA 0.075, WD 6.5mm, Infinity, M25)
Regular price
$3,295.00
The Nikon T Plan 2.5× EPI Reflected Light Objective is a low-magnification reflected light (epi-illumination) objective from Nikon’s T Plan series — delivering a wide field of view with a 6.5mm working distance for large-area overview inspection of opaque specimens including wafers, PCBs, metal components, and other industrial materials. Ideal as a survey objective for locating regions of interest before switching to higher magnification.
KEY FEATURES
- 2.5× wide-area overview — low magnification for rapid survey and navigation of large specimen areas, enabling efficient identification of regions of interest before switching to higher magnification objectives
- Working distance: 6.5mm — generous clearance for imaging large, thick, or mounted specimens without risk of contact between the objective and specimen surface
- Reflected light (epi-illumination) design — optimized for incident light microscopy of opaque specimens including metals, semiconductors, ceramics, PCBs, and polished surfaces
- M25 thread mount — compatible with Nikon CFI series industrial and upright microscopes; BD nosepiece adapter also available upon request
- Infinity-corrected — compatible with all Nikon infinity-corrected microscope systems
- 🇯🇵 Nikon quality, made in Japan — precision optical construction for consistent, high-efficiency light transmission and long service life
- New — catalog number MUE12030
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Technical Specifications
| Catalog Number | MUE12030 |
| Magnification | 2.5× |
| Numerical Aperture (NA) | 0.075 |
| Immersion Medium | Dry (air) |
| Working Distance | 6.5mm |
| Illumination Type | Reflected light (epi-illumination) |
| Optical Design | T Plan EPI (Plan, reflected light) |
| Correction | Infinity-corrected |
| Thread / Mount | M25 (BD nosepiece adapter available upon request) |
| Compatible Microscopes | Nikon CFI infinity-corrected industrial and upright microscopes |
| Country of Origin | Japan |
| Condition | New |
| SKU | MUE12030 |
Microscope Compatibility
Typical Applications
Wide-area survey and navigation of semiconductor wafers and die
PCB and electronics assembly overview inspection
Large metal component and surface survey before high-magnification examination
Rapid defect location and region-of-interest identification
Overview documentation of large specimens for quality control records
Any application requiring wide-field reflected light overview at low magnification
