Nikon T Plan 1x EPI Reflected Light Objective (NA 0.03, WD 3.8mm, Infinity, M25)

In stock

SKU: MUE12010

Regular price $2,795.00
Sale price $2,795.00 Regular price $5,800.00 save $3,005.00
The Nikon T Plan 1× EPI Reflected Light Objective is an ultra-low magnification reflected light (epi-illumination) objective from Nikon’s T Plan series — delivering the widest possible field of view for large-area survey and navigation of opaque specimens including full wafers, large PCBs, metal panels, and other oversized industrial materials. The ideal starting point for any reflected light inspection workflow, enabling rapid specimen orientation and region-of-interest identification before stepping up through higher magnification objectives. Offered here new at significant savings versus the list price.

KEY FEATURES

  • 1× ultra-wide-area overview — the lowest magnification in the Nikon T Plan EPI series, providing the maximum field of view for rapid survey of the largest specimens — full wafers, large PCBs, metal panels, and oversized components
  • Working distance: 3.8mm — generous clearance for imaging large, thick, or mounted specimens without risk of contact between the objective and specimen surface
  • Reflected light (epi-illumination) design — optimized for incident light microscopy of opaque specimens including metals, semiconductors, ceramics, PCBs, and polished surfaces
  • M25 thread mount — compatible with Nikon CFI series industrial and upright microscopes; BD nosepiece adapter also available upon request
  • Infinity-corrected — compatible with all Nikon infinity-corrected microscope systems
  • 🇯🇵 Nikon quality, made in Japan — precision optical construction for consistent, high-efficiency light transmission and long service life
  • New — catalog number MUE12010
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Product Overview

The Nikon T Plan 1× EPI is the lowest magnification objective in the Nikon T Plan EPI reflected light series — designed for ultra-wide-area survey and specimen orientation in industrial and materials microscopy. At 1×, this objective provides the maximum possible field of view for reflected light imaging, enabling rapid navigation across full wafer surfaces, large PCB assemblies, metal panels, and other oversized specimens that would require extensive stage movement to survey at higher magnifications. In a typical inspection workflow, the 1× T Plan EPI serves as the starting objective for specimen orientation and coarse defect location, before stepping up to the 2.5× for area selection and then to higher magnification objectives for detailed inspection. The 3.8mm working distance provides ample clearance for the full range of specimen types and mounting configurations. The T Plan optical design provides flat-field correction for consistent image quality across the full field of view. The M25 thread mount is compatible with Nikon CFI series industrial and upright microscopes; a BD nosepiece adapter is also available upon request for use on BD-type nosepieces. Supplied new from stock, catalog number MUE12010.

Technical Specifications

Catalog Number MUE12010
Magnification
Numerical Aperture (NA) 0.03
Immersion Medium Dry (air)
Working Distance 3.8mm
Illumination Type Reflected light (epi-illumination)
Optical Design T Plan EPI (Plan, reflected light)
Correction Infinity-corrected
Thread / Mount M25 (BD nosepiece adapter available upon request)
Compatible Microscopes Nikon CFI infinity-corrected industrial and upright microscopes
Country of Origin Japan
Condition New
SKU MUE12010

Microscope Compatibility

Typical Applications

Full-wafer survey and orientation before high-magnification semiconductor inspection
Large PCB and electronics assembly overview at maximum field of view
Metal panel, sheet, and large component surface survey
Rapid specimen orientation and coarse defect location in multi-magnification inspection workflows
Overview documentation of large specimens for quality control records
Any application requiring the widest possible reflected light field of view at 1×
  • Designed for Mixed-Brand Lab Environments

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    Ideal for labs using multiple microscope platforms

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