Nikon T Plan 1x EPI Reflected Light Objective (NA 0.03, WD 3.8mm, Infinity, M25)
Regular price
$2,795.00
Sale price
$2,795.00
Regular price
$5,800.00
save $3,005.00
The Nikon T Plan 1× EPI Reflected Light Objective is an ultra-low magnification reflected light (epi-illumination) objective from Nikon’s T Plan series — delivering the widest possible field of view for large-area survey and navigation of opaque specimens including full wafers, large PCBs, metal panels, and other oversized industrial materials. The ideal starting point for any reflected light inspection workflow, enabling rapid specimen orientation and region-of-interest identification before stepping up through higher magnification objectives. Offered here new at significant savings versus the list price.
KEY FEATURES
- 1× ultra-wide-area overview — the lowest magnification in the Nikon T Plan EPI series, providing the maximum field of view for rapid survey of the largest specimens — full wafers, large PCBs, metal panels, and oversized components
- Working distance: 3.8mm — generous clearance for imaging large, thick, or mounted specimens without risk of contact between the objective and specimen surface
- Reflected light (epi-illumination) design — optimized for incident light microscopy of opaque specimens including metals, semiconductors, ceramics, PCBs, and polished surfaces
- M25 thread mount — compatible with Nikon CFI series industrial and upright microscopes; BD nosepiece adapter also available upon request
- Infinity-corrected — compatible with all Nikon infinity-corrected microscope systems
- 🇯🇵 Nikon quality, made in Japan — precision optical construction for consistent, high-efficiency light transmission and long service life
- New — catalog number MUE12010
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Technical Specifications
| Catalog Number | MUE12010 |
| Magnification | 1× |
| Numerical Aperture (NA) | 0.03 |
| Immersion Medium | Dry (air) |
| Working Distance | 3.8mm |
| Illumination Type | Reflected light (epi-illumination) |
| Optical Design | T Plan EPI (Plan, reflected light) |
| Correction | Infinity-corrected |
| Thread / Mount | M25 (BD nosepiece adapter available upon request) |
| Compatible Microscopes | Nikon CFI infinity-corrected industrial and upright microscopes |
| Country of Origin | Japan |
| Condition | New |
| SKU | MUE12010 |
Microscope Compatibility
Typical Applications
Full-wafer survey and orientation before high-magnification semiconductor inspection
Large PCB and electronics assembly overview at maximum field of view
Metal panel, sheet, and large component surface survey
Rapid specimen orientation and coarse defect location in multi-magnification inspection workflows
Overview documentation of large specimens for quality control records
Any application requiring the widest possible reflected light field of view at 1×
