Nikon LU Plan ELWD 50x Brightfield Darkfield Objective

High-resolution 50× industrial objective with exceptional 9.8mm working distance for brightfield and darkfield reflected light microscopy of opaque materials.

• 🔬 50× Magnification, 0.55 NA — Excellent resolving power for detailed surface inspection and microstructural analysis.
• 📏 9.8mm Extra-Long Working Distance — Exceptional clearance accommodates thick, uneven, or mounted specimens while maintaining optical performance.
• 🌓 Brightfield & Darkfield Capable — Dual-mode illumination reveals both surface detail and topographical features in a single objective.
• ∞ Infinity-Corrected Optics — LU Plan design ensures compatibility with modern Nikon industrial microscope systems.
• ✨ Excellent Condition, As-New — Pre-owned objective in excellent, as-new condition with pristine optical performance.

🔧 Product Description

The Nikon LU Plan ELWD 50× Brightfield Darkfield Objective (MUE60501) is a high-performance industrial objective designed for reflected light microscopy of opaque materials including metals, semiconductors, ceramics, and engineered surfaces. This objective combines medium-high magnification with exceptional working distance and dual illumination modes, providing outstanding versatility for demanding inspection and analysis applications.

The 50× magnification and 0.55 numerical aperture provide an optimal balance between field of view and resolution, making this objective ideal for examining microstructural features, grain boundaries, phase composition, and surface defects. This magnification range is particularly valuable for metallographic analysis, semiconductor inspection, and quality control applications where operators need to survey larger areas while maintaining the ability to resolve fine details.

The 9.8mm extra-long working distance (ELWD) is a standout feature of this objective—more than double the working distance of standard 50× objectives. This extended clearance provides significant advantages when examining thick specimens, samples mounted in fixtures, rough or highly textured surfaces, tilted or angled specimens, and samples requiring manipulation during observation. The generous clearance also provides protective margin that reduces the risk of objective damage from accidental contact.

The objective supports both brightfield and darkfield illumination modes, offering versatile imaging capabilities in a single lens. Brightfield mode provides conventional reflected light imaging ideal for examining polished surfaces, grain structure, and phase composition in metallographic samples. Darkfield mode enhances contrast for surface features, scratches, cracks, and topographical variations by illuminating the sample at oblique angles. This dual capability eliminates the need to switch objectives when changing illumination modes, improving workflow efficiency.

The LU Plan (Long-distance Universal Plan) optical design delivers flat-field correction across the entire field of view, ensuring sharp focus from center to edge—essential for accurate measurement, documentation, and analysis. The infinity-corrected design enables integration with tube lenses, beam splitters, and camera systems without introducing optical aberrations.

The M32 thread mount is compatible with Nikon industrial microscopes featuring BD (brightfield/darkfield) nosepieces, including the Nikon Eclipse LV and Nikon Epiphot series.

This unit is in excellent, as-new pre-owned condition, ready for demanding industrial inspection and materials analysis applications.

🔎 Typical Applications

• Metallographic analysis and grain structure examination
• Semiconductor wafer and die inspection
• Surface defect detection and coating analysis
• Industrial quality control and failure analysis
• Materials science research and characterization
• Precision machined surface evaluation
• Educational and training laboratories
• Forensic materials examination

📊 Key Specifications

University purchase orders accepted. Contact us for volume pricing and institutional procurement options.