Nikon LU Plan ELWD 100x Brightfield Darkfield Objective

High-magnification 100× industrial objective with extra-long working distance for brightfield and darkfield reflected light microscopy of opaque materials.

• 🔬 100× Magnification, 0.80 NA — High-resolution imaging with excellent resolving power for detailed surface inspection and analysis.
• 📏 3.5mm Extra-Long Working Distance — Extended clearance protects objective lens from contact with samples and accommodates varied surface topographies.
• 🌓 Brightfield & Darkfield Capable — Dual-mode illumination reveals both surface detail and topographical features in a single objective.
• ∞ Infinity-Corrected Optics — LU Plan design ensures compatibility with modern Nikon industrial microscope systems.
• ✨ New/Open Box Condition — Factory-new objective with full optical performance and manufacturer specifications.

🔧 Product Description

The Nikon LU Plan ELWD 100× Brightfield Darkfield Objective (MUE60901) is a high-performance industrial objective designed for reflected light microscopy of opaque materials including metals, semiconductors, ceramics, and engineered surfaces. This objective combines high magnification with extended working distance, enabling detailed inspection of complex surface features while maintaining safe clearance between the objective and specimen.

The 100× magnification and 0.80 numerical aperture provide exceptional resolving power and image detail, revealing microstructural features, surface defects, and fine-scale topography that would be invisible at lower magnifications. The high NA ensures excellent light-gathering capability and contrast, critical for imaging low-reflectivity materials or subtle surface variations.

The 3.5mm extra-long working distance (ELWD) is a key advantage in industrial microscopy applications. Standard 100× objectives typically offer working distances of 1mm or less, making them vulnerable to contact damage when examining rough surfaces, tilted specimens, or samples with significant topographical variation. The extended working distance of this objective provides protective clearance while maintaining high optical performance, reducing the risk of lens contamination or damage during routine inspection work.

The objective supports both brightfield and darkfield illumination modes, offering versatile imaging capabilities in a single lens. Brightfield mode provides conventional reflected light imaging ideal for examining polished surfaces, grain structure, and phase composition in metallographic samples. Darkfield mode enhances contrast for surface features, scratches, cracks, and topographical variations by illuminating the sample at oblique angles, causing surface irregularities to scatter light into the objective while flat areas remain dark.

The LU Plan (Long-distance Universal Plan) optical design delivers flat-field correction across the entire field of view, ensuring sharp focus from center to edge—essential for accurate measurement, documentation, and analysis. The infinity-corrected design enables integration with tube lenses, beam splitters, and camera systems without introducing optical aberrations.

The M32 thread mount is compatible with Nikon industrial microscopes featuring BD (brightfield/darkfield) nosepieces, including the Nikon Eclipse LV and Nikon Epiphot series.

This unit is in new/open box condition, ready for demanding industrial inspection and materials analysis applications.

🔎 Typical Applications

• Metallographic analysis and grain structure examination
• Semiconductor wafer and die inspection
• Surface defect detection and characterization
• Failure analysis and quality control
• Coating and thin film inspection
• Precision machined surface evaluation
• Materials science research
• Forensic materials examination

📊 Key Specifications

University purchase orders accepted. Contact us for volume pricing and institutional procurement options.