MUE10050
MUE10050

Nikon LU Plan Fluor 5x Reflected Light Objective

In stock

SKU: MUE10050

$495.00
$495.00 $895.00 save $400.00
Nikon LU Plan Fluor 5x reflected light objective designed for high-quality imaging in metallurgical and industrial microscopy. Provides clear, sharp observation of opaque samples and surface details. Compatible with select Nikon reflected light microscope systems. Excellent working condition.

KEY FEATURES

  • Epi reflected light objective for infinity-corrected industrial microscope systems
  • LU Plan Fluor optical design for flat, high-contrast, high-throughput brightfield imaging
  • Low magnification wide-area scanning — ideal for large sample overview and navigation
  • M32 thread mount — fits Nikon reflected light microscopes with LU nosepiece
  • Excellent condition — flawless optics
  • Made in Japan by Nikon
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Product Overview

The Nikon LU Plan Fluor 5x Reflected Light Objective (SKU: MUE10050) is an infinity-corrected, epi-illumination objective designed for Nikon's industrial reflected light microscope systems, including the Nikon LV, MM, and Eclipse L series with LU nosepieces. The LU Plan Fluor optical design delivers exceptional flatness of field and high light transmission across the full image area — critical for accurate low-magnification survey work and automated stage scanning. At 5x, this objective provides a broad field of view for rapid sample navigation, region-of-interest identification, and large-area surface inspection before stepping up to higher magnifications. This unit is in excellent condition with flawless optics, offering outstanding value compared to new.

Technical Specifications

Magnification 5x
Optical System Infinity Corrected
Optical Design LU Plan Fluor
Illumination Type Epi (Reflected Light)
Contrast Method Brightfield
Numerical Aperture (NA) 0.15
Working Distance 20.0 mm
Thread Mount M32 (Nikon LU Nosepiece)
Immersion Dry
Tube Length Infinity
Compatible Systems Nikon LV, MM, Eclipse L series (LU nosepiece)
Catalog Number MUE10050
SKU MUE10050
Country of Origin Japan
Condition Excellent

Microscope Compatibility

Typical Applications

Large-area wafer and semiconductor surface survey
PCB and electronics overview inspection
Metallurgical sample navigation and region selection
Thin film and coating uniformity screening
Automated stage scanning and stitching workflows
Industrial quality control and failure analysis
Research and university laboratory use

  • Designed for Mixed-Brand Lab Environments

    Olympus, Nikon, Zeiss, Leica components in one place

  • Quality-Verified New & Pre-Owned Equipment

    Professionally sourced and verified for performance

  • Backed by Spach Optics Warranty & Support

    Ideal for labs using multiple microscope platforms

  • Fast, Reliable U.S. Shipping

    Most orders ship quickly from within the United States

  • Expert Support from Optical Specialists

    Guidance on compatibility, selection, and configuration