Nikon CF Plan EPI 100x SLWD Objective

High-magnification 100× industrial objective with super-long 4.7mm working distance for reflected light microscopy of opaque materials.

• 🔬 100× Magnification, 0.73 NA — High-resolution imaging with excellent resolving power for detailed surface inspection and analysis.
• 📏 4.7mm Super-Long Working Distance — Extended clearance protects objective lens and accommodates varied surface topographies.
• 🌓 CF Plan Epi Design — Flat-field correction with optimized contrast for reflected light microscopy of opaque materials.
• ∞ Infinity-Corrected Optics — CF (Crystal Focus) design ensures compatibility with Nikon infinity-corrected microscope systems.
• 📍 Perfect Optics — Flawless optical performance; minor cosmetic wear on exterior housing does not affect imaging quality.

🔧 Product Description

The Nikon CF Plan Epi 100× SLWD Objective (MUL04900) is a high-performance industrial objective designed for reflected light microscopy of opaque materials including metals, semiconductors, ceramics, and engineered surfaces. This objective combines high magnification with super-long working distance, enabling detailed inspection of complex surface features while maintaining protective clearance between the objective and specimen.

The 100× magnification and 0.73 numerical aperture provide exceptional resolving power and image detail, revealing microstructural features, surface defects, and fine-scale topography invisible at lower magnifications. The high NA ensures excellent light-gathering capability and contrast, critical for imaging low-reflectivity materials or subtle surface variations.

The 4.7mm super-long working distance (SLWD) is a defining feature of this objective. Standard 100× objectives typically offer working distances of 1mm or less, making them vulnerable to contact damage when examining rough surfaces, tilted specimens, or samples with significant topographical variation. The 4.7mm working distance—nearly five times longer than standard 100× objectives—provides exceptional protective clearance while maintaining high optical performance. This extended working distance is particularly valuable when examining:

• Rough or textured surfaces with significant height variation
• Tilted or angled specimens requiring oblique viewing
• Samples mounted in fixtures or holders
• Specimens requiring manipulation or probing during observation
• Materials prone to contaminating the objective front lens

The CF Plan (Crystal Focus Plan) optical design delivers flat-field correction across the entire field of view, ensuring sharp focus from center to edge—essential for accurate measurement, documentation, and analysis. The Epi (reflected light) designation indicates optimization for brightfield reflected light microscopy, with optical coatings and design elements that maximize contrast and image quality when examining opaque materials.

The infinity-corrected design enables integration with tube lenses, beam splitters, and camera systems without introducing optical aberrations, providing flexibility for advanced imaging workflows including digital documentation, measurement, and analysis.

The RMS thread mount is compatible with Nikon infinity-corrected industrial microscopes and other microscope systems accepting RMS-threaded objectives.

This unit features perfect optics with flawless imaging performance. The exterior housing shows minor cosmetic scratches (visible in product photos) that do not affect optical quality or functionality—a common characteristic of pre-owned industrial objectives that have seen professional use.

🔎 Typical Applications

• Metallographic analysis and grain structure examination
• Semiconductor wafer and die inspection
• Surface defect detection and characterization
• Failure analysis and quality control
• Coating and thin film inspection
• Precision machined surface evaluation
• Materials science research
• Forensic materials examination

📊 Key Specifications

University purchase orders accepted. Contact us for volume pricing and institutional procurement options.