Nikon CF Plan EPI 100x SLWD Objective

In stock

SKU: MUL04900

Regular price $1,200.00
Sale price $1,200.00 Regular price $5,995.00 save $4,795.00
High-magnification 100× industrial objective with super-long 4.7mm working distance for reflected light microscopy of opaque materials.

KEY FEATURES

  • 100× Magnification, 0.73 NA — High-resolution imaging with excellent resolving power for detailed surface inspection and analysis.
  • 4.7mm Super-Long Working Distance — Extended clearance protects objective lens and accommodates varied surface topographies.
  • CF Plan Epi Design — Flat-field correction with optimized contrast for reflected light microscopy of opaque materials.
  • ∞ Infinity-Corrected Optics — CF (Crystal Focus) design ensures compatibility with Nikon infinity-corrected microscope systems.
  • Perfect Optics — Flawless optical performance; minor cosmetic wear on exterior housing does not affect imaging quality.
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Product Overview

The Nikon CF Plan Epi 100× SLWD Objective (MUL04900) is a high-performance industrial objective designed for reflected light microscopy of opaque materials including metals, semiconductors, ceramics, and engineered surfaces. This objective combines high magnification with super-long working distance, enabling detailed inspection of complex surface features while maintaining protective clearance between the objective and specimen.

The 100× magnification and 0.73 numerical aperture provide exceptional resolving power and image detail, revealing microstructural features, surface defects, and fine-scale topography invisible at lower magnifications. The high NA ensures excellent light-gathering capability and contrast, critical for imaging low-reflectivity materials or subtle surface variations.

The 4.7mm super-long working distance (SLWD) is a defining feature of this objective. Standard 100× objectives typically offer working distances of 1mm or less, making them vulnerable to contact damage when examining rough surfaces, tilted specimens, or samples with significant topographical variation. The 4.7mm working distance—nearly five times longer than standard 100× objectives—provides exceptional protective clearance while maintaining high optical performance. This extended working distance is particularly valuable when examining

Rough or textured surfaces with significant height variation Tilted or angled specimens requiring oblique viewing Samples mounted in fixtures or holders Specimens requiring manipulation or probing during observation Materials prone to contaminating the objective front lens

The CF Plan (Crystal Focus Plan) optical design delivers flat-field correction across the entire field of view, ensuring sharp focus from center to edge—essential for accurate measurement, documentation, and analysis. The Epi (reflected light) designation indicates optimization for brightfield reflected light microscopy, with optical coatings and design elements that maximize contrast and image quality when examining opaque materials.

The infinity-corrected design enables integration with tube lenses, beam splitters, and camera systems without introducing optical aberrations, providing flexibility for advanced imaging workflows including digital documentation, measurement, and analysis.

The RMS thread mount is compatible with Nikon infinity-corrected industrial microscopes and other microscope systems accepting RMS-threaded objectives.

This unit features perfect optics with flawless imaging performance. The exterior housing shows minor cosmetic scratches (visible in product photos) that do not affect optical quality or functionality—a common characteristic of pre-owned industrial objectives that have seen professional use.

Technical Specifications

Catalog Number MUL04900
Magnification 100×
Numerical Aperture (NA) 0.73
Working Distance 4.7mm (Super-Long)
Optical Design CF Plan Epi SLWD (Crystal Focus Plan, Epi, Super-Long Working Distance)
Illumination Mode Epi (reflected light)
Correction Infinity-corrected
Field Correction Plan (flat-field)
Thread Type RMS (Royal Microscopical Society)
Compatibility Nikon infinity-corrected microscopes
Application Reflected light microscopy of opaque materials
Condition Perfect optics; minor cosmetic wear on exterior housing

Microscope Compatibility

Typical Applications

Metallographic analysis and grain structure examination
Semiconductor wafer and die inspection
Surface defect detection and characterization
Failure analysis and quality control
Coating and thin film inspection
Precision machined surface evaluation
Materials science research
Forensic materials examination
  • Designed for Mixed-Brand Lab Environments

    Olympus, Nikon, Zeiss, Leica components in one place

  • Quality-Verified New & Pre-Owned Equipment

    Professionally sourced and verified for performance

  • Backed by Spach Optics Warranty & Support

    Ideal for labs using multiple microscope platforms

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    Guidance on compatibility, selection, and configuration